SCHEMBL31364136

SCHEMBL31364136

C=CC(=O)NCOCCN1CCNC1=O

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 1/20 0.40
KMT2A Q03164 1/20 0.40
ALDH1A1 P00352 5/20 0.39
KDM4E B2RXH2 3/20 0.39
LMNA P02545 1/20 0.39
CREBBP Q92793 1/20 0.34
TSHR P16473 1/20 0.33
MAPK1 P28482 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
HPGDS O60760 1/20 0.33
PDK2 Q15119 1/20 0.33
RET P07949 1/20 0.32
KDR P35968 1/20 0.32
KRAS P01116 1/20 0.32
FPR3 P25089 3/20 0.32
FPR2 P25090 3/20 0.32
ENPP2 Q13822 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3681795 0.85 KMT2A (0.44) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL975894 0.82 KMT2A (0.53) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL26852111 0.79 KMT2A (0.40) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL167047 0.77 ALDH1A1 (0.42) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL1628393 0.76 ALDH1A1 (0.39) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL6881865 0.74 RAB9A (0.40) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL21872003 0.72 KMT2A (0.35) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL6286812 0.72 KMT2A (0.38) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL94299 0.72 ALDH1A1 (0.38) RAB9AKMT2AALDH1A1KDM4ELMNA
SCHEMBL1626503 0.72 RAB9A (0.46) RAB9AKMT2AALDH1A1KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119644685-A High-efficiency positive photoresist stripping solution and preparation method thereof 浙江尚能实业股份有限公司 2025-03-18 CN claimed
CN-119472194-A Phenol-free positive photoresist stripping liquid and preparation method thereof 浙江尚能实业股份有限公司 2025-02-18 CN claimed
CN-119644685-A High-efficiency positive photoresist stripping solution and preparation method thereof 浙江尚能实业股份有限公司 2025-03-18 CN disclosed
CN-119472194-A Phenol-free positive photoresist stripping liquid and preparation method thereof 浙江尚能实业股份有限公司 2025-02-18 CN disclosed