SCHEMBL31364147

SCHEMBL31364147

C=CNC(=O)CCC(=O)NN

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.52
KDM5C P41229 1/20 0.52
PHF8 Q9UPP1 1/20 0.52
KDM2A Q9Y2K7 1/20 0.52
ALDH1A1 P00352 4/20 0.50
CTSD P07339 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.39
MAPT P10636 3/20 0.36
GAA P10253 3/20 0.34
KDM6B O15054 1/20 0.34
KDM4A O75164 1/20 0.34
KDM5A P29375 1/20 0.34
HTT P42858 2/20 0.34
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
POLB P06746 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL223004 0.81 ALDH1A1 (0.33) KDM4EKDM5CPHF8KDM2AALDH1A1
SCHEMBL220310 0.79 KDM4E (0.77) KDM4EKDM5CPHF8KDM2AALDH1A1
SCHEMBL24309157 0.78
SCHEMBL223005 0.78 PHF8 (0.50) KDM4EKDM5CPHF8KDM2AALDH1A1
Hydrazine SCHEMBL28064827 0.76 KDM4E (0.72) KDM4EKDM5CPHF8KDM2AALDH1A1
SCHEMBL8440530 0.75
SCHEMBL29158015 0.75 TSHR (0.50) ALDH1A1MAPTLMNACYP3A4TSHR
SCHEMBL11055881 0.74 TSHR (0.45) KDM4EALDH1A1MAPTLMNACYP1A2
SCHEMBL10594684 0.74 MAPT (0.45) KDM4EALDH1A1MAPTCYP1A2CYP3A4
SCHEMBL2744516 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119644685-A High-efficiency positive photoresist stripping solution and preparation method thereof 浙江尚能实业股份有限公司 2025-03-18 CN claimed
CN-119644685-A High-efficiency positive photoresist stripping solution and preparation method thereof 浙江尚能实业股份有限公司 2025-03-18 CN disclosed