Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.33 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7647445 | 0.80 | ESR1 (0.46) | ESR1ESR2 | |
| SCHEMBL21947723 | 0.78 | ALDH1A1 (0.46) | ALDH1A1TSHRTDP1HDAC8HSD17B2 | |
| SCHEMBL3275977 | 0.77 | TYR (0.52) | ALDH1A1ESR1ESR2 | |
| SCHEMBL6314694 | 0.75 | TP53 (0.44) | ALDH1A1TSHRTDP1 | |
| SCHEMBL9570579 | 0.75 | ALDH1A1 (0.42) | ALDH1A1TSHRTDP1HSD17B2 | |
| SCHEMBL17388520 | 0.75 | ALDH1A1 (0.42) | ALDH1A1TSHRTDP1HSD17B2 | |
| Potassium Ion SCHEMBL15955811 | 0.74 | ALDH1A1 (0.41) | ALDH1A1TSHRTDP1HSD17B2 | |
| SCHEMBL9570862 | 0.74 | ALDH1A1 (0.41) | ALDH1A1TSHRTDP1HSD17B2ESR1 | |
| SCHEMBL17288936 | 0.73 | ALDH1A1 (0.58) | ALDH1A1TSHRTDP1HDAC8HSD17B2 | |
| SCHEMBL6946790 | 0.72 | ALDH1A1 (0.65) | ALDH1A1TSHRTDP1HDAC8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | claimed |
| US-6794109-B2 | POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2004-09-21 | — | — | US | claimed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | claimed |
| US-20020160297-A1 | Low abosorbing resists for 157 nm lithography | AIR FORCE, UNITED STATES | 2002-10-31 | — | — | US | claimed |
| WO-2002069043-A2 | LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-09-06 | — | — | WO | claimed |
| US-10641938-B2 | Film forming composition, hardcoat film, polarizing plate, and method for manufacturing hydrophilized hardcoat film | FUJIFILM CORPORATION (JP) | 2020-05-05 | — | — | US | disclosed |
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-7696210-B2 | Gonadotropin releasing hormone receptor antagonists | WYETH (US) | 2010-04-13 | — | — | US | disclosed |
| US-7696210-B2 | Gonadotropin releasing hormone receptor antagonists | WYETH (US) | 2010-04-13 | — | — | US | disclosed |
| US-7696210-B2 | Gonadotropin releasing hormone receptor antagonists | WYETH (US) | 2010-04-13 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-6794109-B2 | POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2004-09-21 | — | — | US | disclosed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | disclosed |
| US-20040034160-A1 | Acetal protected polymers and photoresists compositions thereof | ARCH SPECIALITY CHEMICALS, INC. | 2004-02-19 | — | — | US | disclosed |
| US-6680157-B1 | MIXING WITH AROMATIC COMPOUND | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2004-01-20 | — | — | US | disclosed |
| WO-2003099782-A2 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-12-04 | — | — | WO | disclosed |
| US-20020160297-A1 | Low abosorbing resists for 157 nm lithography | AIR FORCE, UNITED STATES | 2002-10-31 | — | — | US | disclosed |
| WO-2002069043-A2 | LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002031598-A2 | RESIST METHODS AND MATERIALS FOR UV AND ELECTRON-BEAM LITHOGRAPHY WITH REDUCED OUTGASSING | MASSACHUSETTS INSTITUTE OF TECHNOLOGY, INC. (US) | 2002-04-18 | — | — | WO | disclosed |