SCHEMBL31413604

SCHEMBL31413604

C=Cc1ccc2cc(C(=O)O)ccc2c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.50
ALDH1A1 P00352 3/20 0.46
KMT2A Q03164 3/20 0.46
HPGD P15428 2/20 0.46
HSD17B10 Q99714 2/20 0.46
MEN1 O00255 2/20 0.46
TP53 P04637 2/20 0.46
MAPT P10636 2/20 0.46
EGFR P00533 1/20 0.46
CYP3A4 P08684 1/20 0.46
PKM P14618 1/20 0.46
ALOX15 P16050 1/20 0.46
ALOX12 P18054 1/20 0.46
JAK1 P23458 1/20 0.46
MAPK1 P28482 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
PTPN1 P18031 2/20 0.42
RARB P10826 3/20 0.42
RARG P13631 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11963928 1.00 KDM4E (0.50) KDM4EALDH1A1KMT2AHPGDHSD17B10
Hydrochloric Acid SCHEMBL472326 0.98 KDM4E (0.49) KDM4EALDH1A1KMT2AHPGDHSD17B10
Acetic Acid SCHEMBL11898840 0.95 KDM4E (0.50) KDM4EALDH1A1KMT2AHPGDHSD17B10
Beta-Naphtoic Acid SCHEMBL28438616 0.84 ALDH1A1 (0.59) KDM4EALDH1A1KMT2AHPGDHSD17B10
SCHEMBL10077147 0.83 CYP3A4 (0.44) KDM4EALDH1A1KMT2AHPGDHSD17B10
SCHEMBL472323 0.83 CYP3A4 (0.44) KDM4EALDH1A1KMT2AHPGDHSD17B10
SCHEMBL30196606 0.82 ALDH1A1 (0.63) KDM4EALDH1A1KMT2AHPGDHSD17B10
SCHEMBL691707 0.82 ALDH1A1 (0.63) KDM4EALDH1A1KMT2AHPGDHSD17B10
Propene SCHEMBL27591205 0.82 KDM4E (0.60) KDM4EALDH1A1KMT2AHPGDHSD17B10
Ethylene SCHEMBL1311687 0.81 KDM4E (0.63) KDM4EALDH1A1KMT2AHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025041533-A1 SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD AND FILM-FORMING COMPOSITION JSR株式会社 2025-02-27 WO disclosed