Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | EGFR | P00533 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.44 |
| ▸ | JAK1 | P23458 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | PLAU | P00749 | 2/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
| ▸ | CES1 | P23141 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11963928 | 0.83 | KDM4E (0.50) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL31413604 | 0.83 | KDM4E (0.50) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL727139 | 0.82 | CES2 (0.52) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL29375279 | 0.82 | CES2 (0.52) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| Hydrochloric Acid SCHEMBL472326 | 0.81 | KDM4E (0.49) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL10077147 | 0.81 | CYP3A4 (0.44) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL362842 | 0.80 | ALDH1A1 (0.52) | ALDH1A1TDP1KMT2ATAS1R3TAS1R1 | |
| Acetic Acid SCHEMBL11898840 | 0.79 | KDM4E (0.50) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL8775402 | 0.78 | LCK (0.48) | CYP3A4ALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL4590567 | 0.77 | PTPN11 (0.53) | ALDH1A1KDM4ETDP1MEN1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| CN-102516453-B | Polymer, chemically amplified negative resist composition and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-01 | — | — | CN | disclosed |
| CN-105607426-A | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO | 2016-05-25 | — | — | CN | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| CN-102516453-A | Polymer, chemically amplified negative resist composition and pattern forming method | SHINETSU CHEMICAL CO | 2012-06-27 | — | — | CN | disclosed |
| US-20120028190-A1 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120028190-A1 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| EP-2412733-A1 | Polymer, chemically amplified negative resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2412733-A1 | Polymer, chemically amplified negative resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |