Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR | P02766 | 2/20 | 0.56 |
| ▸ | ERN1 | O75460 | 1/20 | 0.47 |
| ▸ | ALB | P02768 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7103109 | 0.77 | TTR (0.56) | TTRERN1ALBMEN1LMNA | |
| SCHEMBL7792827 | 0.76 | TTR (0.36) | TTRERN1 | |
| Triiodophenol SCHEMBL338137 | 0.74 | TTR (1.00) | TTRERN1ALBMEN1LMNA | |
| SCHEMBL5303099 | 0.70 | TTR (0.59) | TTRERN1ALBMEN1LMNA | |
| SCHEMBL425350 | 0.68 | TTR (0.56) | TTRERN1MEN1HTTKMT2A | |
| SCHEMBL29396210 | 0.68 | TTR (0.56) | TTRERN1MEN1HTTKMT2A | |
| SCHEMBL28278148 | 0.67 | TTR (0.41) | TTRERN1 | |
| SCHEMBL95554 | 0.67 | ERN1 (0.31) | TTRERN1 | |
| SCHEMBL23803707 | 0.67 | TTR (0.54) | TTRERN1MEN1HTTKMT2A | |
| SCHEMBL340511 | 0.67 | TTR (0.54) | TTRERN1MEN1HTTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8603731-B2 | Resist underlayer film forming composition for electron beam lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-12-10 | — | — | US | disclosed |
| EP-2120095-B1 | USE OF A COMPOSITION FOR FORMING A RESIST LOWER LAYER FILM FOR ELECTRON LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-7736822-B2 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20100081081-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| EP-2120095-A1 | RESIST LOWER LAYER FILM FORMING COMPOSITION FOR ELECTRON LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-20070190459-A1 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |