SCHEMBL31474465

SCHEMBL31474465

C=CC(=O)OC12CC3CC(CC(C3)C1)C2.C=Cc1ccc(CCC)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 7/20 0.52
CYP19A1 P11511 2/20 0.39
CYP17A1 P05093 1/20 0.36
HDAC3 O15379 1/20 0.35
HDAC4 P56524 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC10 Q969S8 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
HDAC5 Q9UQL6 1/20 0.35
THRA P10827 4/20 0.35
MAPK1 P28482 1/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
ALDH1A1 P00352 2/20 0.34
NPSR1 Q6W5P4 2/20 0.34
LMNA P02545 1/20 0.34
EPHX2 P34913 1/20 0.34
FAAH O00519 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5450986 0.87 THRB (0.46) THRBCYP19A1HDAC3HDAC4HDAC1
SCHEMBL5447304 0.81 THRB (0.45) THRBTHRAMEN1KMT2AALDH1A1
Alcohol SCHEMBL17107774 0.77 NAAA (0.39) THRBCYP19A1CYP17A1MEN1KMT2A
SCHEMBL5449150 0.77 ESR1 (0.39) THRBCYP19A1CYP17A1HDAC3HDAC4
Methyl Alcohol SCHEMBL17107776 0.76 NAAA (0.42) THRBCYP19A1CYP17A1MEN1KMT2A
SCHEMBL43550 0.76 NAAA (0.41) THRBCYP19A1CYP17A1MEN1KMT2A
Water SCHEMBL27689962 0.74 NAAA (0.40) THRBCYP19A1CYP17A1MEN1KMT2A
Hydrogen Sulfide SCHEMBL27689942 0.74 NAAA (0.40) THRBCYP19A1CYP17A1MEN1KMT2A
SCHEMBL5446054 0.73 KMT2A (0.37) THRBCYP19A1HDAC3HDAC4HDAC1
SCHEMBL5440495 0.73 KMT2A (0.41) CYP19A1CYP17A1HDAC3HDAC4HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed