SCHEMBL31474471

SCHEMBL31474471

C=CC(=O)OC(C)(C)CC.C=Cc1ccc(CC)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 5/20 0.40
THRA P10827 1/20 0.35
MAOB P27338 2/20 0.35
ALDH1A1 P00352 2/20 0.34
MAPT P10636 5/20 0.34
LMNA P02545 3/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
HPGD P15428 1/20 0.34
TAS1R3 Q7RTX0 1/20 0.34
TAS1R1 Q7RTX1 1/20 0.34
KDM4E B2RXH2 2/20 0.33
HTT P42858 2/20 0.33
XBP1 P17861 1/20 0.33
ATM Q13315 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
TP53 P04637 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31474456 0.89 THRB (0.55) THRBTHRAALDH1A1MAPTTAS1R3
SCHEMBL5449149 0.87 MAOB (0.33) THRBTHRAMAOBALDH1A1TAS1R3
SCHEMBL31474480 0.87 PPARA (0.36) THRBMAOBALDH1A1MAPTSMN1; SMN2
SCHEMBL31474504 0.87 THRB (0.52) THRBTHRAALDH1A1HPGDMEN1
SCHEMBL31474463 0.87 THRB (0.37) THRBALDH1A1LMNASMN1; SMN2TAS1R3
SCHEMBL31474498 0.86 CYP1A2 (0.41) THRBALDH1A1MAPTLMNASMN1; SMN2
Styrene SCHEMBL31474496 0.85 ALDH1A1 (0.42) THRBTHRAALDH1A1MAPTLMNA
SCHEMBL31474478 0.83 MAPT (0.34) THRBTHRAMAOBALDH1A1MAPT
SCHEMBL31474462 0.83 SMN1; SMN2 (0.39) THRBALDH1A1MAPTLMNASMN1; SMN2
SCHEMBL31474470 0.81 TSHR (0.39) THRBALDH1A1MAPTSMN1; SMN2TAS1R3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed