⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12092171 | 0.96 | TSHR (0.39) | — | |
| SCHEMBL16543622 | 0.96 | TSHR (0.39) | — | |
| SCHEMBL18912481 | 0.96 | TSHR (0.39) | — | |
| SCHEMBL9526687 | 0.96 | TSHR (0.39) | — | |
| Hydrochloric Acid SCHEMBL19617019 | 0.94 | LMNA (0.41) | — | |
| SCHEMBL21491423 | 0.86 | TSHR (0.41) | — | |
| SCHEMBL6463788 | 0.85 | TSHR (0.50) | — | |
| SCHEMBL28626375 | 0.85 | CES2 (0.39) | — | |
| Hydrochloric Acid SCHEMBL342951 | 0.85 | KDM4E (0.41) | — | |
| SCHEMBL28630314 | 0.84 | TSHR (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109651286-B | High-selectivity synthesis method of 4- (4-aminophenyl) morpholine-3-one | 新发药业有限公司 | 2020-08-11 | — | — | CN | claimed |
| CN-109651286-A | A kind of highly selective 4-(4- aminophenyl) morpholine -3- ketone synthetic method | 新发药业有限公司 | 2019-04-19 | — | — | CN | claimed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| CN-111381447-B | Photosensitive resin composition, laminate, and pattern forming method | 信越化学工业株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-117501180-A | Laminate, method for producing laminate, and method for forming pattern | 信越化学工业株式会社 | 2024-02-02 | — | — | CN | disclosed |
| CN-109388023-B | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming method | 信越化学工业株式会社 | 2023-12-22 | — | — | CN | disclosed |
| CN-109388022-B | Silicone-structure-containing polymer, photosensitive resin composition, photosensitive resin coating layer, photosensitive dry film, laminate, and pattern forming method | 信越化学工业株式会社 | 2023-07-28 | — | — | CN | disclosed |
| CN-113527680-B | Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component | 信越化学工业株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| CN-108388082-B | Photosensitive resin composition, photosensitive dry film, photosensitive resin coating and pattern forming method | 信越化学工业株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-110727174-A | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film and black matrix | 信越化学工业株式会社 | 2020-01-24 | — | — | CN | disclosed |
| CN-105315467-B | Polymer having organosilicon structure, negative resist composition, photocurable dry film, and patterning method | 信越化学工业株式会社 | 2019-12-20 | — | — | CN | disclosed |
| CN-109651286-A | A kind of highly selective 4-(4- aminophenyl) morpholine -3- ketone synthetic method | 新发药业有限公司 | 2019-04-19 | — | — | CN | disclosed |
| US-8283358-B2 | N-sulfonamido polycyclic pyrazolyl compounds | ELAN PHARMACEUTICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-20100081680-A1 | N-SULFONAMIDO POLYCYCLIC PYRAZOLYL COMPOUNDS | ELAN PHARMACEUTICALS, INC. | 2010-04-01 | — | — | US | disclosed |
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-20060147836-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| US-20050079446-A1 | Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| US-20050079440-A1 | Novel polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |