Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 3/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 4/20 | 0.38 |
| ▸ | NQO2 | P16083 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | ESRRG | P62508 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 2/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.36 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.36 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.36 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.36 |
| ▸ | MASP2 | O00187 | 1/20 | 0.34 |
| ▸ | PLAU | P00749 | 1/20 | 0.34 |
| ▸ | THPO | P40225 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3149927 | 1.00 | CYP19A1 (0.41) | CYP19A1EPHX2PTGS1NQO2PTGS2 | |
| SCHEMBL3421062 | 0.82 | PTGS1 (0.54) | PTGS1NQO2PTGS2MAPTALDH1A1 | |
| SCHEMBL18634918 | 0.82 | PTGS1 (0.54) | PTGS1NQO2PTGS2MAPTALDH1A1 | |
| SCHEMBL7628787 | 0.82 | PTGS1 (0.54) | PTGS1NQO2PTGS2MAPTALDH1A1 | |
| SCHEMBL11147182 | 0.82 | TSHR (0.43) | PTGS1NQO2PTGS2NPC1MAPT | |
| SCHEMBL3442786 | 0.76 | KDM1A (0.39) | MAPTALDH1A1MAPK1ESRRGESR1 | |
| SCHEMBL3442788 | 0.76 | KDM1A (0.39) | MAPTALDH1A1MAPK1ESRRGESR1 | |
| SCHEMBL2989490 | 0.74 | KDM1A (0.38) | MAPTALDH1A1MAPK1ESRRGESR1 | |
| SCHEMBL11725109 | 0.74 | ELANE (0.49) | NPC1MAPTRAB9AESR1MEN1 | |
| SCHEMBL31033328 | 0.74 | EPHX2 (0.34) | CYP19A1EPHX2PTGS1NPC1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250110406-A1 | METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PATTERN FORMING METHOD, AND RESIST COMPOSITION PURIFIED PRODUCT | TOKYO OHKA KOGYO CO LTD (JP) | 2025-04-03 | — | — | US | disclosed |
| US-20250050269-A1 | GAS SEPARATION MEMBRANE, GAS SEPARATION MEMBRANE MODULE, AND GAS PERMEABLE APPARATUS | HITACHI GE VERNOVA NUCLEAR ENERGY, LTD. (JP) | 2025-02-13 | — | — | US | disclosed |
| US-12186715-B2 | Production method for resist composition purified product, resist pattern forming method, and resist composition purified product | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-01-07 | — | — | US | disclosed |
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240270919-A1 | COMPOSITION FOR PRODUCING POROUS FILM, METHOD FOR PRODUCING POROUS FILM, AND POROUS FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-08-15 | — | — | US | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| WO-2024062988-A1 | RESIN FILM, SCRIBING DEVICE, AND SCRIBING METHOD | 三星ダイヤモンド工業株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20240100482-A1 | FILTERING DEVICE, PURIFICATION DEVICE, AND METHOD FOR MANUFACTURING CHEMICAL LIQUID | FUJIFILM CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| US-20240084091-A1 | POROUS FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-03-14 | — | — | US | disclosed |
| EP-4327919-A1 | POROUS FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-28 | — | — | EP | disclosed |
| EP-1906246-A2 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |
| US-5756254-A | CONTAINING PHOTOSENSITIVE ACID GENERATOR | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-26 | — | — | US | disclosed |
| US-5753407-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-19 | — | — | US | disclosed |
| US-5585217-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-12-17 | — | — | US | disclosed |
| US-5518864-A | PHOTOSENSITIVE, QUINONE DIAZIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-05-21 | — | — | US | disclosed |
| EP-0431971-B1 | Photosensitive composition and resin-encapsulated semiconductor device | TOSHIBA KK (JP) | 1995-07-19 | — | — | EP | disclosed |
| EP-0431971-A2 | Photosensitive composition and resin-encapsulated semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-06-12 | — | — | EP | disclosed |
| US-4500719-A | Process for the preparation of N-alkenylphenylmaleimides and N,N'-[alkenylenephenylene]bismalemides | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1985-02-19 | — | — | US | disclosed |
| US-4376206-A | QUICK-CURABLE HEAT RESISTANT RESINS | MITSUI TOATSU CHEMICALS, INC. (JP) | 1983-03-08 | — | — | US | disclosed |
| US-4323662-A | Thermosetting resin compositions comprising bismaleimides and alkenylaniline derivatives | MITSUI TOATSU CHEMICALS, INC. (JP) | 1982-04-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12186715-B2 | Production method for resist composition purified product, resist pattern forming method, and resist composition purified product | PUF60, RIOK2, SLC11A2 | CYP19A1 4377/4885EPHX2 2845/4885PTGS1 2455/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.