Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 3/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 4/20 | 0.38 |
| ▸ | NQO2 | P16083 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | ESRRG | P62508 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 2/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.36 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.36 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.36 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.36 |
| ▸ | MASP2 | O00187 | 1/20 | 0.34 |
| ▸ | PLAU | P00749 | 1/20 | 0.34 |
| ▸ | THPO | P40225 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3149925 | 1.00 | CYP19A1 (0.41) | CYP19A1EPHX2PTGS1NQO2PTGS2 | |
| SCHEMBL18634918 | 0.82 | PTGS1 (0.54) | PTGS1NQO2PTGS2MAPTALDH1A1 | |
| SCHEMBL7628787 | 0.82 | PTGS1 (0.54) | PTGS1NQO2PTGS2MAPTALDH1A1 | |
| SCHEMBL11147182 | 0.82 | TSHR (0.43) | PTGS1NQO2PTGS2NPC1MAPT | |
| SCHEMBL3421062 | 0.82 | PTGS1 (0.54) | PTGS1NQO2PTGS2MAPTALDH1A1 | |
| SCHEMBL3442788 | 0.76 | KDM1A (0.39) | MAPTALDH1A1MAPK1ESRRGESR1 | |
| SCHEMBL3442786 | 0.76 | KDM1A (0.39) | MAPTALDH1A1MAPK1ESRRGESR1 | |
| SCHEMBL2989490 | 0.74 | KDM1A (0.38) | MAPTALDH1A1MAPK1ESRRGESR1 | |
| SCHEMBL11725109 | 0.74 | ELANE (0.49) | NPC1MAPTRAB9AESR1MEN1 | |
| SCHEMBL31033328 | 0.74 | EPHX2 (0.34) | CYP19A1EPHX2PTGS1NPC1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-56026849-A | — | — | None | — | — | JP | disclosed |
| JP-57054153-A | — | — | None | — | — | JP | disclosed |
| CN-114008525-B | Method for producing purified resist composition, method for forming resist pattern, and purified resist composition | 东京应化工业株式会社 | 2025-05-23 | — | — | CN | disclosed |
| US-20250153114-A1 | POLYIMIDE-CONTAINING FILTRATION MEMBRANE, FILTERS, AND METHODS | ENTEGRIS, INC. | 2025-05-15 | — | — | US | disclosed |
| US-20250110406-A1 | METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PATTERN FORMING METHOD, AND RESIST COMPOSITION PURIFIED PRODUCT | TOKYO OHKA KOGYO CO LTD (JP) | 2025-04-03 | — | — | US | disclosed |
| CN-119552505-A | Composition for producing porous film, method for producing porous film, and porous film | 东京应化工业株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-119503516-A | Slitting machine and system for manufacturing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-119503513-A | Winding device, film winding method, and method for producing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| US-20250050269-A1 | GAS SEPARATION MEMBRANE, GAS SEPARATION MEMBRANE MODULE, AND GAS PERMEABLE APPARATUS | HITACHI GE VERNOVA NUCLEAR ENERGY, LTD. (JP) | 2025-02-13 | — | — | US | disclosed |
| CN-107249720-B | Method for purifying liquid, method for producing chemical liquid or cleaning liquid, filter medium, and filter device | 东京应化工业株式会社 | 2025-01-10 | — | — | CN | disclosed |
| US-5753407-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-19 | — | — | US | disclosed |
| US-5585217-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-12-17 | — | — | US | disclosed |
| US-5518864-A | PHOTOSENSITIVE, QUINONE DIAZIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-05-21 | — | — | US | disclosed |
| EP-0431971-B1 | Photosensitive composition and resin-encapsulated semiconductor device | TOSHIBA KK (JP) | 1995-07-19 | — | — | EP | disclosed |
| EP-0431971-A2 | Photosensitive composition and resin-encapsulated semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-06-12 | — | — | EP | disclosed |
| US-4500719-A | Process for the preparation of N-alkenylphenylmaleimides and N,N'-[alkenylenephenylene]bismalemides | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1985-02-19 | — | — | US | disclosed |
| US-4376206-A | QUICK-CURABLE HEAT RESISTANT RESINS | MITSUI TOATSU CHEMICALS, INC. (JP) | 1983-03-08 | — | — | US | disclosed |
| US-4323662-A | Thermosetting resin compositions comprising bismaleimides and alkenylaniline derivatives | MITSUI TOATSU CHEMICALS, INC. (JP) | 1982-04-06 | — | — | US | disclosed |
| JP-S5754153-A | AROMATIC DIISOCYANATE AND ITS PREPARATION | MITSUI TOATSU CHEM INC | 1982-03-31 | — | — | JP | disclosed |
| JP-S5626849-A | P-ISOPROPENYLANILINE DIMER AND ITS PREPARATION | MITSUI TOATSU CHEM INC | 1981-03-16 | — | — | JP | disclosed |