Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 10/20 | 0.59 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.59 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | HDAC3 | O15379 | 3/20 | 0.41 |
| ▸ | HDAC1 | Q13547 | 3/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 3/20 | 0.41 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.41 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.39 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.39 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.39 |
| ▸ | TACR2 | P21452 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3020449 | 0.91 | ESR1 (0.70) | ESR1ESR2SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL3401646 | 0.88 | ESR1 (0.47) | ESR1ESR2ALOX15HDAC3HDAC1 | |
| SCHEMBL6743316 | 0.85 | ESR1 (0.62) | ESR1ESR2SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL31757305 | 0.84 | ESR1 (0.61) | ESR1ESR2SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL3137055 | 0.84 | ESR2 (0.61) | ESR1ESR2CYP3A4ALDH1A1 | |
| SCHEMBL1691543 | 0.83 | ESR1 (0.60) | ESR1ESR2SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL6743890 | 0.83 | ESR1 (0.60) | ESR1ESR2SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL6744335 | 0.83 | ESR1 (0.60) | ESR1ESR2SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL3154886 | 0.81 | ALOX15 (0.54) | ESR1ESR2ALOX15SLC6A2SLC6A4 | |
| SCHEMBL9164873 | 0.79 | ESR1 (0.55) | ESR1ESR2SLC6A2SLC6A4SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2137140-B1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL SCIENT IND RES (IN) | 2010-11-10 | — | — | EP | claimed |
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2010-04-01 | — | — | US | claimed |
| EP-2137140-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | Council of Scientific&Industrial Research (IN) | 2009-12-30 | — | — | EP | claimed |
| WO-2008117308-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2008-10-02 | — | — | WO | claimed |
| US-8563215-B2 | Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2013-10-22 | — | — | US | disclosed |
| US-8563215-B2 | Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2013-10-22 | — | — | US | disclosed |
| US-8563215-B2 | Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2013-10-22 | — | — | US | disclosed |
| EP-2137140-B1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL SCIENT IND RES (IN) | 2010-11-10 | — | — | EP | disclosed |
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2010-04-01 | — | — | US | disclosed |
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2010-04-01 | — | — | US | disclosed |
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2010-04-01 | — | — | US | disclosed |
| EP-2137140-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | Council of Scientific&Industrial Research (IN) | 2009-12-30 | — | — | EP | disclosed |
| WO-2008117308-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2008-10-02 | — | — | WO | disclosed |
| WO-2008117308-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2008-10-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | NRP1, NR4A1, SNX1 | ESR1 175/4885ESR2 885/4885ALOX15 722/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.