SCHEMBL3157658

SCHEMBL3157658

C=C(C)C(=O)OC1COC(=O)C1C(=O)OC1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
TDP1 Q9NUW8 2/20 0.32
ALDH1A1 P00352 5/20 0.32
HSD17B10 Q99714 3/20 0.32
ALOX15 P16050 2/20 0.32
MAPK1 P28482 2/20 0.32
MAPK10 P53779 1/20 0.32
FABP7 O15540 1/20 0.32
FABP5 Q01469 1/20 0.32
GAA P10253 1/20 0.31
NTSR1 P30989 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
GPX4 P36969 1/20 0.31
ADORA2B P29275 2/20 0.31
TP53 P04637 1/20 0.31
KDM4E B2RXH2 2/20 0.30
HPGD P15428 1/20 0.30
NPC1 O15118 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3158302 0.85 MAPT (0.36) ALDH1A1HSD17B10GAASMN1; SMN2KDM4E
SCHEMBL3367198 0.85
SCHEMBL3162534 0.83 ALDH1A1 (0.31) ALDH1A1
SCHEMBL3154773 0.82 ALDH1A1 (0.37) TDP1ALDH1A1GPX4KDM4ENPC1
SCHEMBL3161100 0.81 ALDH1A1 (0.32) ALDH1A1
SCHEMBL3154234 0.81 FABP7 (0.33) EPHX1ALDH1A1FABP7FABP5SMN1; SMN2
SCHEMBL3167532 0.78 ALDH1A1 (0.33) TDP1ALDH1A1GPX4KDM4ENPC1
SCHEMBL3150428 0.78 MAPK1 (0.38) TDP1ALDH1A1MAPK1GAAGPX4
SCHEMBL3149864 0.78 ALDH1A1 (0.40) L3MBTL1TDP1ALDH1A1HSD17B10GAA
SCHEMBL3149373 0.76 ALDH1A1 (0.37) TDP1ALDH1A1HSD17B10GPX4ADORA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
EP-1225480-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-03-17 EP disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7144675-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-12-05 US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 US disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6838225-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-01-04 US disclosed
US-20040048192-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-03-11 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020132181-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-09-19 US disclosed
EP-1225480-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-07-24 EP disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed