SCHEMBL3149864

SCHEMBL3149864

C=C(C)C(=O)OC1COC(=O)C1C(=O)OCC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.40
KDM4E B2RXH2 3/20 0.39
HPGD P15428 2/20 0.39
HSD17B10 Q99714 2/20 0.39
TSHR P16473 1/20 0.36
MAPT P10636 3/20 0.35
ATM Q13315 2/20 0.35
GAA P10253 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
THRB P10828 1/20 0.34
GPX4 P36969 1/20 0.34
POLB P06746 2/20 0.33
NPC1 O15118 1/20 0.33
PKM P14618 1/20 0.33
HTT P42858 1/20 0.33
RECQL P46063 1/20 0.33
RAB9A P51151 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3149373 0.89 ALDH1A1 (0.37) ALDH1A1KDM4EHPGDHSD17B10TSHR
SCHEMBL3159034 0.87 TSHR (0.42) ALDH1A1KDM4EHPGDTSHRMEN1
SCHEMBL3164407 0.85 TSHR (0.46) ALDH1A1KDM4EHPGDHSD17B10TSHR
SCHEMBL3154773 0.84 ALDH1A1 (0.37) ALDH1A1KDM4EMAPTATMKMT2A
SCHEMBL3159283 0.82 ALDH1A1 (0.31) ALDH1A1KDM4EHPGDHSD17B10
SCHEMBL3167753 0.82 ADORA2B (0.33) ALDH1A1
SCHEMBL3168325 0.81 ALDH1A1 (0.33) ALDH1A1KDM4EMAPTATMGPX4
SCHEMBL3150428 0.81 MAPK1 (0.38) ALDH1A1KDM4EMAPTATMGAA
SCHEMBL3167532 0.81 ALDH1A1 (0.33) ALDH1A1KDM4ETSHRMAPTATM
SCHEMBL3159389 0.80 ALDH1A1 (0.38) ALDH1A1KDM4EHPGDHSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
EP-1225480-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-03-17 EP disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7144675-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-12-05 US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 US disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6838225-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-01-04 US disclosed
US-20040048192-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-03-11 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020132181-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-09-19 US disclosed
EP-1225480-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-07-24 EP disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed