Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.33 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.33 |
| ▸ | GABRR1 | P24046 | 2/20 | 0.30 |
| ▸ | GABRR2 | P28476 | 2/20 | 0.30 |
| ▸ | BLM | P54132 | 2/20 | 0.30 |
| ▸ | GABRR3 | A8MPY1 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | APEX1 | P27695 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL154825 | 0.84 | TSHR (0.38) | TSHRTP53EGLN1EGLN3GABRR1 | |
| SCHEMBL17451338 | 0.78 | TSHR (0.33) | TSHRTP53EGLN1EGLN3GABRR1 | |
| SCHEMBL119386 | 0.77 | TSHR (0.32) | TSHRTP53EGLN1EGLN3 | |
| SCHEMBL9627725 | 0.75 | TSHR (0.31) | TSHRTP53EGLN1EGLN3 | |
| Acrylic Acid SCHEMBL6123355 | 0.72 | LMNA (0.37) | LMNA | |
| SCHEMBL8040717 | 0.71 | TSHR (0.35) | TSHRTP53EGLN1EGLN3GABRR1 | |
| SCHEMBL9346200 | 0.71 | — | — | |
| SCHEMBL18173557 | 0.70 | TSHR (0.33) | TSHRTP53EGLN1EGLN3GABRR1 | |
| SCHEMBL1421018 | 0.69 | — | — | |
| SCHEMBL9178471 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2001917-B1 | SOLID POLYMERIC ELECTROLYTES BASED ON TRIBLOCK COPOLYMERS, IN PARTICULAR POLYSTYRENE-POLY(OXYETHYLENE)-POLYSTYRENE COPOLYMERS | ARKEMA FRANCE (FR) | 2014-07-02 | — | — | EP | claimed |
| EP-0720053-B1 | Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate | TOKYO OHKA KOGYO CO LTD (JP) | 2002-09-04 | — | — | EP | claimed |
| US-5858540-A | CROSSLINKABLE COMPOSITION CONSISTING OF TERPOLYMER HAVING UNITS OF HEXAFLUOROPROPYLENE, TETRAFLUOROETHYLENE AND VINYLIDENE FLUORIDE, MULTIFUNCTIONAL MONOMER HAVING TWO OR MORE UNSATURATED BONDS; HEAT SETTABLE, HEAT SHRINKABLE | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 1999-01-12 | — | — | US | claimed |
| EP-0283990-B1 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO LTD (JP) | 1994-01-26 | — | — | EP | claimed |
| WO-2021014956-A1 | PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2021-01-28 | — | — | WO | disclosed |
| US-10816900-B2 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-27 | — | — | US | disclosed |
| WO-2020044918-A1 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2020-03-05 | — | — | WO | disclosed |
| US-10203601-B2 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-02-12 | — | — | US | disclosed |
| US-20190018320-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-17 | — | — | US | disclosed |
| US-20180120702-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-03 | — | — | US | disclosed |
| EP-3315504-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-05-02 | — | — | EP | disclosed |
| US-8865110-B2 | Method for producing graphite film and graphite film produced by the method | KANEKA CORPORATION (JP) | 2014-10-21 | — | — | US | disclosed |
| US-20100001641-A1 | SUBSTRATE STRUCTURE FOR PLASMA DISPLAY PANEL, METHOD OF MANUFACTURING THE SUBSTRATE STRUCTURE, AND PLASMA DISPLAY PANEL INCLUDING THE SUBSTRATE STRUCTURE | SAMSUNG SDI CO., LTD. (KR) | 2010-01-07 | — | — | US | disclosed |
| US-20100001640-A1 | PASTE CONTAINING ALUMINUM FOR PREPARING PDP ELECTRODE, METHOD OF PREPARING THE PDP ELECTRODE USING THE PASTE AND PDP ELECTRODE PREPARED USING THE METHOD | SAMSUNG SDI CO., LTD. (KR) | 2010-01-07 | — | — | US | disclosed |
| US-20080067938-A1 | ELECTRODE-FORMING COMPOSITION AND PLASMA DISPLAY PANEL MANUFACTURED USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2008-03-20 | — | — | US | disclosed |
| EP-1901331-A2 | Electrode-Forming Composition and Plasma Display Panel Manufactured Using the Same | Samsung SDI Co., Ltd. (KR) | 2008-03-19 | — | — | EP | disclosed |
| US-20080050305-A1 | Method for Producing Graphite Film, and Graphite Film Produced By the Method | KANEKA CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20060166113-A1 | Photosensitive paste composition and plasma display panel manufactured using the same | SAMSUNG SDI CO., LTD. (KR) | 2006-07-27 | — | — | US | disclosed |
| US-20060164011-A1 | Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP including the PDP electrode | SAMSUNG SDI CO., LTD., A CORPORATION OF THE REPUBLIC OF KOREA (KR) | 2006-07-27 | — | — | US | disclosed |
| US-20050271979-A1 | Photosensitive paste composition, PDP electrode prepared therefrom, and PDP comprising the PDP electrode | SAMSUNG SDI CO., LTD. (KR) | 2005-12-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190018320-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | TET1, KDM2B, ARCN1 | TSHR 4134/4885TP53 4350/4885EGLN1 1232/4885 |
| US-10816900-B2 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | TET1, KDM2B, ARCN1 | TSHR 4134/4885TP53 4350/4885EGLN1 1232/4885 |
| US-20180120702-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | TET1, KDM1A, KDM2B | TSHR 3618/4885TP53 4301/4885EGLN1 1166/4885 |
| US-10203601-B2 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | TET1, KDM1A, KDM2B | TSHR 3618/4885TP53 4301/4885EGLN1 1166/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.