SCHEMBL3160002

SCHEMBL3160002

C=COCCOC(O)(COCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7179939 0.79 ALDH1A1 (0.33)
SCHEMBL11792366 0.77 ALDH1A1 (0.32)
SCHEMBL6887437 0.77 ALDH1A1 (0.32)
SCHEMBL22712842 0.77
SCHEMBL8616121 0.74 TSHR (0.35)
SCHEMBL3163324 0.74
SCHEMBL3160168 0.74
Tert-Butylamine SCHEMBL28062341 0.71
SCHEMBL160024 0.70
SCHEMBL6648012 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1505090-B1 REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION NIPPON CATALYTIC CHEM IND (JP) 2010-03-31 EP disclosed
EP-1505090-A1 REACTIVE DILUENT COMPOSITION AND CURABLE RESIN COMPOSITION Nippon Shokubai Co., Ltd. (JP) 2005-02-09 EP disclosed
US-6767980-B2 ACTIVATED ENERGY RAY-CURABLE INK COMPOSITION FOR INK-JET PRINTING; VINYL ETHER GROUP-CONTAINING (METH)ACRYLIC ESTER NIPPON SHOKUBAI CO., LTD. (JP) 2004-07-27 US disclosed
US-20030199655-A1 Reactive diluent and curable resin composition NIPPON SHOKUBAI CO., LTD. 2003-10-23 US disclosed