SCHEMBL31618868

SCHEMBL31618868

O=C(Cc1ccc(O)c(O)c1)Cc1ccc(O)c(O)c1

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.72
MAPT P10636 4/20 0.72
HIF1A Q16665 4/20 0.72
HSD17B10 Q99714 4/20 0.72
TDP1 Q9NUW8 3/20 0.72
GAA P10253 2/20 0.72
APEX1 P27695 2/20 0.72
THPO P40225 2/20 0.72
LMNA P02545 2/20 0.72
HPGD P15428 2/20 0.72
BLM P54132 2/20 0.72
RGS12 O14924 1/20 0.72
POLB P06746 1/20 0.72
TSHR P16473 1/20 0.72
NFKB1 P19838 1/20 0.72
GNAI1 P63096 1/20 0.72
PMP22 Q01453 1/20 0.72
CA1 P00915 1/20 0.58
CA2 P00918 1/20 0.58
CA4 P22748 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22982989 1.00 KDM4E (0.72) KDM4EMAPTHIF1AHSD17B10TDP1
SCHEMBL30575218 0.89 KDM4E (0.64) KDM4EMAPTHIF1AHSD17B10TDP1
SCHEMBL29262781 0.89 KDM4E (0.64) KDM4EMAPTHIF1AHSD17B10TDP1
SCHEMBL7152577 0.87 IAPP (0.68) KDM4EMAPTHIF1AHSD17B10TDP1
3,4-Dihydroxyphenylacetic Acid SCHEMBL36348 0.84 GAA (1.00) KDM4EMAPTHIF1AHSD17B10TDP1
3,4-Dihydroxyphenylacetic Acid SCHEMBL29382155 0.84 GAA (1.00) KDM4EMAPTHIF1AHSD17B10TDP1
SCHEMBL7174072 0.82 KDM4E (0.56) KDM4EMAPTHIF1AHSD17B10TDP1
3,4-Dihydroxyphenylacetic Acid SCHEMBL8214151 0.82 GAA (0.96) KDM4EMAPTHIF1AHSD17B10TDP1
3,4-Dihydroxyphenylacetic Acid SCHEMBL8214149 0.82 KDM4E (0.67) KDM4EMAPTHIF1AHSD17B10TDP1
SCHEMBL2734611 0.82 KDM4E (0.67) KDM4EMAPTHIF1AHSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed