SCHEMBL316823

SCHEMBL316823

C=Cc1ccc(COCCC)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
CHRNB2 P17787 1/20 0.41
CHRNB4 P30926 1/20 0.41
CHRNA3 P32297 1/20 0.41
CHRNA7 P36544 1/20 0.41
CHRNA4 P43681 1/20 0.41
TAS1R3 Q7RTX0 1/20 0.35
TAS1R1 Q7RTX1 1/20 0.35
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
TSHR P16473 2/20 0.33
HDAC8 Q9BY41 1/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
TDP1 Q9NUW8 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
HPGD P15428 2/20 0.32
MAPT P10636 2/20 0.32
THRB P10828 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8727985 0.95 CHRNB2 (0.38) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL8730992 0.95 CHRNB2 (0.38) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL8732923 0.95 CHRNB2 (0.38) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL1316435 0.89 CHRNB2 (0.42) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL18832287 0.88 ALDH1A1 (0.50) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL1664388 0.87 CA1 (0.40) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL7029023 0.87 ALDH1A1 (0.41) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL8727320 0.86 SPHK1 (0.38) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL8727324 0.86 SPHK1 (0.38) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL23727557 0.86 CA1 (0.42) ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118388726-A Solution polymerized styrene butadiene rubber containing N/O/Si functional monomer and preparation method thereof 湖南理工学院 2024-07-26 CN claimed
CN-116693782-A Thermoplastic elastomer containing O/N/Si functional monomer and preparation method thereof 湖南理工学院 2023-09-05 CN claimed
US-12434488-B2 Methods for printing and wrapping SEIKO EPSON CORPORATION (JP) 2025-10-07 US disclosed
US-20250109267-A1 Shrink Film, Container, And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2025-04-03 US disclosed
CN-118388726-A Solution polymerized styrene butadiene rubber containing N/O/Si functional monomer and preparation method thereof 湖南理工学院 2024-07-26 CN disclosed
CN-110462715-B Heat-shrinkable label, package, and method for producing heat-shrinkable label 东洋纺株式会社 2024-05-28 CN disclosed
US-20230365796-A1 MANUFACTURING METHOD FOR HEAT-SHRINKABLE LABEL TOYOBO CO., LTD. (JP) 2023-11-16 US disclosed
US-20230347663-A1 Methods For Printing And Wrapping SEIKO EPSON CORPORATION (JP) 2023-11-02 US disclosed
US-20230333469-A1 FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-19 US disclosed
CN-116693782-A Thermoplastic elastomer containing O/N/Si functional monomer and preparation method thereof 湖南理工学院 2023-09-05 CN disclosed
US-11737345-B2 Organic electronic material, ink composition containing same, and organic thin film, organic electronic element, organic electroluminescent element, lighting device, and display device formed therewith RESONAC CORPORATION (JP) 2023-08-22 US disclosed
US-5247020-A Using a catalyst of aluminoxane and a transition metal compound in the presence of an elastomer IDEMITSU KOSAN CO., LTD. (JP) 1993-09-21 US disclosed
EP-0535582-A1 Process for producing styrenic polymer IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1993-04-07 EP disclosed
EP-0527454-A1 Information recording medium having recording layer with organic polymer and dye contained therein Hitachi Chemical Co., Ltd. (JP) 1993-02-17 EP disclosed
US-5159004-A Polyphenylene ether, propylene polymer, rubbery substance, styrene resin, low molecular weight hydrocarbon resin and white oil and-or liquid parattin SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-10-27 US disclosed
EP-0497207-A2 Process for purification of styrenic polymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1992-08-05 EP disclosed
EP-0440014-A2 Process for producing a styrene polymer composition IDEMITSU KOSAN COMPANY LIMITED (JP) 1991-08-07 EP disclosed
EP-0369814-A2 Thermoplastic resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1990-05-23 EP disclosed
US-4245027-A COMPRISING A POLYVINYLPYRIDINE AND A POLYVINYLIDENE CHLORIDE FUJI PHOTO FILM CO., LTD. (JP) 1981-01-13 US disclosed
US-4172180-A BASIC POLYMER WHICH REACTS WITH HYDROGEN HALIDE AND IS CAPABLE OF FORMING QUATERNARY SALT, AND HALOGEN CONTAINING POLYMER CAPABLE OF FORMING CONJUGATED POLYENE BY ELIMINATION OF HYDROGEN HALIDE FUJI PHOTO FILM CO., LTD. (JP) 1979-10-23 US disclosed