Hydrochloric Acid

Hydrochloric Acid

SCHEMBL3169366

CC1(C)C2=Cc3ccccc3C23CCC2=Cc4ccccc4C21[Zr+2]3.[Cl-].[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL1129489 0.76
Hydrochloric Acid SCHEMBL6910862 0.73
Hydrochloric Acid SCHEMBL940244 0.61
Hydrochloric Acid SCHEMBL2780496 0.60 MEN1 (0.30)
Hydrochloric Acid SCHEMBL6858806 0.60
Hydrochloric Acid SCHEMBL5695313 0.57 CA12 (0.30)
SCHEMBL12813314 0.56 CACNA1G (0.37)
SCHEMBL11618225 0.54 KDM1A (0.35)
Hydrochloric Acid SCHEMBL5907970 0.54 KDM1A (0.32)
Hydrochloric Acid SCHEMBL5845717 0.54 KDM1A (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1260525-B1 1-BUTENE POLYMER AND MOLDED PRODUCT CONSISTING OF THE POLYMER IDEMITSU KOSAN CO (JP) 2012-12-12 EP disclosed
EP-2264077-B1 1-Butene based polymer and the product formed therefrom IDEMITSU KOSAN CO (JP) 2012-06-13 EP disclosed
EP-2264077-A1 1-Butene based polymer and the product formed therefrom Idemitsu Kosan Co., Ltd. (JP) 2010-12-22 EP disclosed
US-7645837-B2 Chlorinated propylene polymer, process for producing the same and use of the same IDEMITSU KOSAN CO., LTD. (JP) 2010-01-12 US disclosed
EP-1659135-B1 CHLORINATED PROPYLENE POLYMER, PROCESS FOR PRODUCING THE SAME, AND USE OF THE SAME IDEMITSU KOSAN CO (JP) 2009-12-02 EP disclosed
US-20090124771-A1 POLYMERIZATION CATALYST AND METHOD FOR PRODUCING POLY-ALPHA-OLEFIN USING THE CATALYST IDEMITSU KOSAN CO., LTD (JP) 2009-05-14 US disclosed
US-20070010630-A1 Chlorinated propylene polymer, process for producing the same and use of the same IDEMITSU KOSAN CO., LTD. (JP) 2007-01-11 US disclosed
US-7067604-B2 1-butene polymer and molded product consisting of the polymer IDEMITSU KOSAN CO., LTD. (JP) 2006-06-27 US disclosed
EP-1659135-A1 CHLORINATED PROPYLENE POLYMER, PROCESS FOR PRODUCING THE SAME, AND USE OF THE SAME IDEMITSU KOSAN CO., LTD. (JP) 2006-05-24 EP disclosed
US-6930160-B2 1-Butene polymer and molded product consisting of the polymer IDEMITSU PETROCHEMICAL CO. LTD. (JP) 2005-08-16 US disclosed
US-20030069320-A1 1-Butene polymer and molded product consisting of the polymer IDEMITSU KOSAN CO. LTD. (JP) 2003-04-10 US disclosed
EP-1260525-A1 1-BUTENE POLYMER AND MOLDED PRODUCT CONSISTING OF THE POLYMER IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-11-27 EP disclosed
US-6433083-B2 MOLDING MATERIAL; HEAT AND SOLVENT RESISTANCE, TOUGHNESS, TENSILE STRENGTH, ELONGATION, TRANSPARENT IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-08-13 US disclosed
US-20010025085-A1 Aromatic vinyl resin material and molded products thereof IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2001-09-27 US disclosed