Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNMT1 | P26358 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | STAT3 | P40763 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Triaziquone SCHEMBL610295 | 0.86 | DNMT1 (0.42) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL10379983 | 0.85 | DNMT1 (0.41) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL2160619 | 0.85 | DNMT1 (0.41) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL11416072 | 0.83 | DNMT1 (0.40) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL600168 | 0.80 | DNMT1 (0.40) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL11644813 | 0.79 | DNMT1 (0.35) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL3700755 | 0.79 | DNMT1 (0.39) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL1961248 | 0.79 | DNMT1 (0.39) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL33439 | 0.78 | HTT (0.42) | DNMT1TP53MAPTSTAT3HTT | |
| Triaziquone SCHEMBL11428634 | 0.78 | DNMT1 (0.41) | DNMT1TP53MAPTSTAT3HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7655378-B2 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| US-20080090179-A1 | Novel polymer, resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |