Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15835198 | 0.82 | DGAT1 (0.35) | DGAT1TSHRHSD17B10 | |
| SCHEMBL23709462 | 0.82 | TSHR (0.36) | DGAT1TSHRHSD17B10 | |
| SCHEMBL18432078 | 0.82 | DGAT1 (0.35) | DGAT1TSHRHSD17B10 | |
| SCHEMBL24839012 | 0.82 | — | — | |
| SCHEMBL9696520 | 0.81 | — | — | |
| SCHEMBL14355440 | 0.80 | DGAT1 (0.34) | DGAT1TSHRHSD17B10 | |
| SCHEMBL12893060 | 0.80 | DGAT1 (0.34) | DGAT1 | |
| SCHEMBL178785 | 0.80 | DGAT1 (0.34) | DGAT1TSHRHSD17B10 | |
| SCHEMBL10093689 | 0.80 | DGAT1 (0.34) | DGAT1 | |
| SCHEMBL17266467 | 0.80 | TSHR (0.35) | TSHRHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 265 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024128279-A1 | PEELING AGENT COMPOSITION FOR PHOTOIRRADIATION-BASED PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER | 日産化学株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024100181-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | MERCK PATENT GMBH (DE) | 2024-05-16 | — | — | WO | disclosed |
| US-20240067836-A1 | CONDUCTIVE STRUCTURE AND ANTISTATIC COMPOSITION INCLUDING THE SAME | DAEJIN ADVANCED MATERIALS INC. (KR) | 2024-02-29 | — | — | US | disclosed |
| WO-2023243475-A1 | ADHESIVE COMPOSITION FOR LIGHT IRRADIATION PEELING, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE OR ELECTRONIC DEVICE LAYER | 日産化学株式会社 | 2023-12-21 | — | — | WO | disclosed |
| WO-2023238885-A1 | METHACRYLIC RESIN, METHOD FOR PRODUCING SAME, RESIN COMPOSITION AND RESIN FILM | 株式会社カネカ | 2023-12-14 | — | — | WO | disclosed |
| WO-2023238886-A1 | METHACRYLIC RESIN AND METHOD FOR PRODUCING SAME, RESIN COMPOSITION, DOPE, AND RESIN FILM | 株式会社カネカ | 2023-12-14 | — | — | WO | disclosed |
| EP-3831613-B1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR | FUJIFILM CORP (JP) | 2023-09-06 | — | — | EP | disclosed |
| EP-3831614-B1 | PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE LAMINATE BODY, PLATEMAKING METHOD FOR PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2023-09-06 | — | — | EP | disclosed |
| EP-3677435-B1 | PRINTING PLATE PRECURSOR AND PRINTING PLATE PRECURSOR LAMINATE | FUJIFILM CORP (JP) | 2023-09-06 | — | — | EP | disclosed |
| WO-2023149421-A1 | TRANSPARENT RESIN SUBSTRATE FOR FLEXIBLE DISPLAY, AND HARD COAT FILM | 株式会社カネカ | 2023-08-10 | — | — | WO | disclosed |
| US-7232644-B2 | Polymerizable composition and negative-working planographic printing plate precursor using the same | FUJIFILM CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20070134590-A1 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070087288-A1 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
| US-20070072118-A1 | Positive photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| EP-1767379-A1 | Infrared-sensitive planographic printing plate precursor | FUJIFILM Corporation (JP) | 2007-03-28 | — | — | EP | disclosed |
| US-20070046715-A1 | Image forming apparatus | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20070026344-A1 | Infrared-sensitive planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-20070003867-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |