SCHEMBL178785

SCHEMBL178785

CCC(C)(C)C(C)(CC(C)(C)C)C(=O)OC

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.34
ALDH1A1 P00352 1/20 0.30
POLB P06746 1/20 0.30
TSHR P16473 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14355440 1.00 DGAT1 (0.34) DGAT1ALDH1A1POLBTSHRHSD17B10
SCHEMBL178647 0.88 DGAT1 (0.34) DGAT1ALDH1A1POLB
SCHEMBL12156823 0.86 DGAT1 (0.33) DGAT1
SCHEMBL25612819 0.85 DGAT1 (0.38) DGAT1ALDH1A1POLBTSHR
SCHEMBL15787234 0.84 DGAT1 (0.32) DGAT1ALDH1A1POLB
SCHEMBL25527221 0.83 DGAT1 (0.34) DGAT1ALDH1A1POLBTSHRHSD17B10
SCHEMBL15787279 0.82 DGAT1 (0.31) DGAT1
SCHEMBL14499263 0.82 ALDH1A1 (0.32) DGAT1ALDH1A1HSD17B10
SCHEMBL13159446 0.82 DGAT1 (0.38) DGAT1
SCHEMBL16141832 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2204698-B1 Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate FUJIFILM CORP (JP) 2018-08-08 EP disclosed
US-9707749-B2 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20170190167-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, AND PRINTING METHOD USING SAME FUJIFILM CORPORATION (JP) 2017-07-06 US disclosed
US-20170045819-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYMER HAVING ACRYLAMIDE STRUCTURE AND ACRYLIC ACID ESTER STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-02-16 US disclosed
US-9541831-B2 Positive resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2017-01-10 US disclosed
US-20160122547-A1 METHOD FOR PRODUCING DYE MULTIMER, AND METHOD FOR PRODUCING COLORING COMPOSITION FUJIFILM CORPORATION (JP) 2016-05-05 US disclosed
US-20160071538-A1 RECORDING MATERIAL AND OPTICAL INFORMATION RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2016-03-10 US disclosed
US-9268063-B2 Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter production method, solid-state image sensor, and image display device FUJIFILM CORPORATION (JP) 2016-02-23 US disclosed
US-9250532-B2 Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-02-02 US disclosed
US-9145497-B2 Colorant-containing particles, colorant-containing particle dispersion, and polymer compound FUJIFILM CORPORATION (JP) 2015-09-29 US disclosed
US-20090047601-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-02-19 US disclosed
US-20090035548-A1 ORGANIC-INORGANIC HYBRID COMPOSITION, METHOD FOR PRODUCING THE SAME, MOLDING AND OPTICAL COMPONENT FUJIFILM CORPORATION (JP) 2009-02-05 US disclosed
US-20090022887-A1 Method for producing and handling of planographic printing plate precursor FUJIFILM CORPORATION (JP) 2009-01-22 US disclosed
US-7416833-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-08-26 US disclosed
US-7402626-B2 Top coat composition CENTRAL GLASS COMPANY, LIMITED (JP) 2008-07-22 US disclosed
US-20070287098-A1 MEHTOD FOR PREPARATION OF LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2007-12-13 US disclosed
US-7279539-B2 Alkali-soluble polymer and polymerizable composition thereof FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed
US-20070212641-A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-7192683-B2 Planographic printing plate precursor FUJI PHOTO FILM CO., LTD (JP) 2007-03-20 US disclosed
US-20070026344-A1 Infrared-sensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-02-01 US disclosed