SCHEMBL3182781

SCHEMBL3182781

CCOC1C(=C=O)C=CC=C1C(=O)c1ccccc1

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
ELANE P08246 2/20 0.34
HPGD P15428 2/20 0.33
LMNA P02545 2/20 0.33
MAPK1 P28482 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
RAB9A P51151 2/20 0.31
NPC1 O15118 1/20 0.31
MAPT P10636 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
SIRT3 Q9NTG7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28476409 0.73 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HPGDLMNAL3MBTL1
SCHEMBL28408210 0.67 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2ELANEHPGDLMNA
SCHEMBL28417966 0.64 ALDH1A1 (0.42) ALDH1A1ELANEHPGDLMNAL3MBTL1
Benzophenone SCHEMBL1147390 0.61 ALDH1A1 (0.64) ALDH1A1SMN1; SMN2ELANEHPGDLMNA
Benzophenone SCHEMBL9809029 0.61 ALDH1A1 (0.64) ALDH1A1SMN1; SMN2ELANEHPGDLMNA
Benzophenone SCHEMBL1147611 0.61 ALDH1A1 (0.64) ALDH1A1SMN1; SMN2ELANEHPGDLMNA
SCHEMBL22129791 0.60 ALDH1A1 (0.37) ALDH1A1SMN1; SMN2ELANEHPGDLMNA
Benzophenone SCHEMBL8089683 0.60 ALDH1A1 (0.78) ALDH1A1SMN1; SMN2ELANEHPGDLMNA
Benzophenone SCHEMBL7925282 0.60 ALDH1A1 (0.61) ALDH1A1SMN1; SMN2ELANEHPGDLMNA
Benzophenone SCHEMBL21082732 0.59 ALDH1A1 (0.74) ALDH1A1SMN1; SMN2ELANEHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023100715-A1 RESIN COMPOSITION, CURED OBJECT, OPTICAL MEMBER, ULTRAVIOLET RAY ABSORBING AGENT, COMPOUND, COMPOUND PRODUCTION METHOD, AND POLYMER 富士フイルム株式会社 2023-06-08 WO disclosed
WO-2022239762-A1 PHOTOPOLYMERIZABLE COMPOSITION, CURED ARTICLE, AND OPTICAL MEMBER 富士フイルム株式会社 2022-11-17 WO disclosed
CN-106133602-B Photosensitive polymer combination, cured film, the manufacturing method of cured film and semiconductor devices 富士胶片株式会社 2019-10-08 CN disclosed
CN-106471089-B Thermokalite producing agent, thermosetting resin composition and application thereof 富士胶片株式会社 2018-10-19 CN disclosed
CN-107966877-A Colored filter composition 富士胶片株式会社 2018-04-27 CN disclosed
CN-105392806-B Coloured composition, cured film, colored filter, the manufacture method of colored filter, solid photographic element and image display device 富士胶片株式会社 2018-04-17 CN disclosed
CN-104185815-B Colour radiation sensitive compositions and its application 富士胶片株式会社 2018-03-23 CN disclosed
CN-107709407-A Polyimide precursor composition, photosensitive polymer combination, cured film, the manufacture method of cured film, the manufacture method of semiconductor devices and polyimide precursor composition 富士胶片株式会社 2018-02-16 CN disclosed
CN-104755517-B Polymerizable composition, polymerizable composition, polymer, optical-use pressure-sensitive adhesive sheet, image display device and its manufacture method 昭和电工株式会社 2017-12-08 CN disclosed
CN-103718106-B Coloring composition, coloring radiation-sensitive composition, color filter, and solid-state imaging device 富士胶片株式会社 2017-10-17 CN disclosed
CN-101218546-A Pattern forming method FUJIFILM CORP (JP) 2008-07-09 CN disclosed
US-20080088813-A1 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 FUJIFILM CORPORATION (JP) 2008-04-17 US disclosed
CN-101137937-A Pattern forming material, pattern forming apparatus, and pattern forming method FUJI FILM CORP (JP) 2008-03-05 CN disclosed
CN-101103310-A Material for pattern formation, apparatus for pattern formation, and method for pattern formation FUJI FILM CORP (JP) 2008-01-09 CN disclosed
CN-101010636-A Pattern forming material, pattern forming apparatus, and pattern forming method FUJI FILM CORP (JP) 2007-08-01 CN disclosed
EP-1801648-A1 PHOTOSENSITIVE TRANSFER MATERIAL AND PATTERN FORMING METHOD AND PATTERN FUJIFILM Corporation (JP) 2007-06-27 EP disclosed
CN-1977221-A Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display FUJI PHOTO FILM CO LTD (JP) 2007-06-06 CN disclosed
CN-1673863-A Pattern forming material, pattern forming apparatus and pattern forming method FUJI PHOTO FILM CO LTD (JP) 2005-09-28 CN disclosed
CN-1641481-A Light-sensitive transfer sheet, light-sensitive layers, method for forming image pattern and method for distribution pattern FUJI PHOTO FILM CO LTD (JP) 2005-07-20 CN disclosed
US-4657942-A LITHOGRAPHIC PRINTING PLATES, RESIN LETTERPRESS, RESISTS, 2-MERCAPTO-1,3,4-TIADIAZOLE FOR INCREASED SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 1987-04-14 US disclosed