SCHEMBL3190355

SCHEMBL3190355

CC(C)(C)OC(=O)COc1cccc([S+](c2ccccc2)c2ccccc2)c1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACLY P53396 3/20 0.40
HPGD P15428 3/20 0.40
MAPT P10636 2/20 0.40
POLB P06746 2/20 0.40
NPSR1 Q6W5P4 2/20 0.40
DDB1 Q16531 1/20 0.40
CRBN Q96SW2 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
LMNA P02545 1/20 0.38
PTPN1 P18031 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
GLA P06280 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
NAMPT P43490 1/20 0.35
CASP3 P42574 1/20 0.34
CASP7 P55210 1/20 0.34
CASP9 P55211 1/20 0.34
KDM4E B2RXH2 2/20 0.34
ALDH1A1 P00352 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30440133 0.90 POLB (0.43) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3181612 0.88 HPGD (0.40) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3194016 0.88 DDB1 (0.47) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3190242 0.85 HPGD (0.39) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3189196 0.85 POLB (0.40) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3189641 0.84 HPGD (0.43) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3193906 0.83 GAA (0.40) HPGDMAPTPOLBNPSR1DDB1
SCHEMBL3183450 0.83 MAPT (0.37) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3193992 0.82 HPGD (0.40) ACLYHPGDMAPTPOLBNPSR1
SCHEMBL3182266 0.82 MAPT (0.40) ACLYHPGDMAPTPOLBNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed