Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 3/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.46 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 2/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL297345 | 0.90 | CYP2C19 (0.46) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 | |
| SCHEMBL10617967 | 0.90 | CYP2C19 (0.46) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 | |
| SCHEMBL3200007 | 0.90 | CYP2C19 (0.50) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 | |
| SCHEMBL3190448 | 0.90 | SIGMAR1 (0.47) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 | |
| SCHEMBL15168865 | 0.89 | CYP2C19 (0.42) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 | |
| SCHEMBL957143 | 0.88 | CYP2C19 (0.44) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 | |
| SCHEMBL4166810 | 0.86 | TAAR1 (0.50) | CYP2C19SMN1; SMN2HIF1ATAAR1SLC6A4 | |
| SCHEMBL117473 | 0.86 | CYP2C19 (0.43) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 | |
| SCHEMBL955632 | 0.86 | TAAR1 (0.50) | CYP2C19SMN1; SMN2HIF1ATAAR1SLC6A4 | |
| SCHEMBL173021 | 0.86 | SMN1; SMN2 (0.46) | CYP2C19SMN1; SMN2HIF1AALDH1A1TAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114149438-A | Quinoxaline and diazole derivatives based on 9, 10-dimethyl-9, 10-ethylene anthracene and preparation method thereof | 华东师范大学 | 2022-03-08 | — | — | CN | claimed |
| CN-117624516-A | Anion exchange resin containing rigid torsion structure and preparation method and application thereof | 清华大学 | 2024-03-01 | — | — | CN | disclosed |
| CN-115651168-A | Phosphine self-provided microporous polymer and application thereof, phosphine self-provided microporous polymer membrane and application thereof | 中国科学技术大学 | 2023-01-31 | — | — | CN | disclosed |
| CN-114149438-A | Quinoxaline and diazole derivatives based on 9, 10-dimethyl-9, 10-ethylene anthracene and preparation method thereof | 华东师范大学 | 2022-03-08 | — | — | CN | disclosed |
| CN-114149438-A | Quinoxaline and diazole derivatives based on 9, 10-dimethyl-9, 10-ethylene anthracene and preparation method thereof | 华东师范大学 | 2022-03-08 | — | — | CN | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20070004816-A1 | Photocurable resin composition | DSM IP ASSETS B.V. (NL) | 2007-01-04 | — | — | US | disclosed |
| CN-1806208-A | Photocurable resin composition | DSM IP ASSETS BV (NL) | 2006-07-19 | — | — | CN | disclosed |
| EP-1634124-A1 | PHOTOCURABLE RESIN COMPOSITION | DSM IP Assets B.V. (NL) | 2006-03-15 | — | — | EP | disclosed |
| WO-2004111733-A1 | PHOTOCURABLE RESIN COMPOSITION | DSM IP ASSETS B.V. (NL) | 2004-12-23 | — | — | WO | disclosed |
| EP-0901043-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| US-6120972-A | COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |