SCHEMBL3200007

SCHEMBL3200007

CC(O)(CCCC(C)(O)c1ccccc1)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 2/20 0.50
LMNA P02545 1/20 0.46
CHRM2 P08172 3/20 0.44
CHRM4 P08173 3/20 0.44
CHRM5 P08912 3/20 0.44
CHRM1 P11229 3/20 0.44
CHRM3 P20309 3/20 0.44
SLC6A4 P31645 1/20 0.44
SLC6A3 Q01959 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
ESR2 Q92731 2/20 0.44
HIF1A Q16665 1/20 0.43
TAAR1 Q96RJ0 1/20 0.43
ALDH1A1 P00352 1/20 0.43
ALOX15 P16050 1/20 0.43
SIGMAR1 Q99720 1/20 0.43
KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3190448 0.95 SIGMAR1 (0.47) CYP2C19LMNACHRM2CHRM4CHRM5
SCHEMBL3190736 0.90 CYP2C19 (0.48) CYP2C19LMNASLC6A4SLC6A3SMN1; SMN2
SCHEMBL845807 0.89 ESR2 (0.47) CYP2C19LMNACHRM2CHRM4CHRM5
SCHEMBL3824700 0.87 KIF11 (0.59) CYP2C19LMNATAAR1
SCHEMBL10441612 0.87 SIGMAR1 (0.46) CYP2C19LMNAESR2SIGMAR1KMT2A
SCHEMBL31729328 0.87 SIGMAR1 (0.42) CYP2C19LMNACHRM2CHRM4CHRM5
SCHEMBL3825253 0.87 KIF11 (0.59) CYP2C19LMNATAAR1
SCHEMBL3831120 0.87 KIF11 (0.59) CYP2C19LMNATAAR1
SCHEMBL10617967 0.86 CYP2C19 (0.46) CYP2C19LMNASLC6A4SLC6A3SMN1; SMN2
SCHEMBL297345 0.86 CYP2C19 (0.46) CYP2C19LMNASLC6A4SLC6A3SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-20070004816-A1 Photocurable resin composition DSM IP ASSETS B.V. (NL) 2007-01-04 US disclosed
EP-1634124-A1 PHOTOCURABLE RESIN COMPOSITION DSM IP Assets B.V. (NL) 2006-03-15 EP disclosed
WO-2004111733-A1 PHOTOCURABLE RESIN COMPOSITION DSM IP ASSETS B.V. (NL) 2004-12-23 WO disclosed
EP-0901043-B1 Radiation-sensitive resin composition JSR CORP (JP) 2004-10-27 EP disclosed
US-6120972-A COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS JSR CORPORATION (JP) 2000-09-19 US disclosed
EP-0901043-A1 Radiation-sensitive resin composition JSR Corporation (JP) 1999-03-10 EP disclosed