⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705479 | 0.70 | — | — | |
| SCHEMBL25231052 | 0.70 | — | — | |
| SCHEMBL706079 | 0.70 | — | — | |
| SCHEMBL5917037 | 0.70 | — | — | |
| SCHEMBL5917053 | 0.67 | — | — | |
| SCHEMBL702746 | 0.65 | — | — | |
| SCHEMBL329326 | 0.65 | — | — | |
| SCHEMBL701366 | 0.65 | — | — | |
| SCHEMBL3157385 | 0.64 | — | — | |
| SCHEMBL705378 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3352281-B1 | NON-AQUEOUS ELECTROLYTE SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORP (JP) | 2021-08-11 | — | — | EP | disclosed |
| CN-108140887-B | Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery | 株式会社艾迪科 | 2021-03-12 | — | — | CN | disclosed |
| US-10734684-B2 | Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery | ADEKA CORPORATION (JP) | 2020-08-04 | — | — | US | disclosed |
| US-20180226683-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROPLYTE SECONDARY BATTERY | ADKEA CORPORATION (JP) | 2018-08-09 | — | — | US | disclosed |
| EP-3352281-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | Adeka Corporation (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-3040396-B1 | ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES | UNIVERSAL DISPLAY CORP (US) | 2018-04-04 | — | — | EP | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |