Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 3/20 | 0.51 |
| ▸ | HPGD | P15428 | 4/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | HTR2A | P28223 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | CNR1 | P21554 | 1/20 | 0.45 |
| ▸ | CNR2 | P34972 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.43 |
| ▸ | EDNRA | P25101 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18670716 | 0.83 | EGFR (0.54) | EGFRHPGDTSHRMAPTHTR2A | |
| SCHEMBL28087180 | 0.82 | HTR2A (0.50) | EGFRHPGDMAPTHTR2AL3MBTL1 | |
| SCHEMBL21438254 | 0.81 | KDM4E (0.66) | EGFRHPGDMAPTCYP1A2CYP2C19 | |
| SCHEMBL3199683 | 0.81 | MTNR1A (0.42) | HPGDMAPTHTR2AL3MBTL1CYP1A2 | |
| SCHEMBL10733811 | 0.81 | EGFR (0.57) | EGFRHPGDTSHRMAPTL3MBTL1 | |
| SCHEMBL10678775 | 0.80 | EGFR (0.47) | EGFRHPGDMAPTCNR1CNR2 | |
| SCHEMBL559460 | 0.80 | HTR2A (0.41) | HPGDHTR2AL3MBTL1CYP1A2CYP2C19 | |
| SCHEMBL28195038 | 0.79 | HTR2A (0.50) | HPGDMAPTHTR2AL3MBTL1CYP1A2 | |
| SCHEMBL12800027 | 0.79 | KDM4E (0.46) | EGFRHPGDTSHRMAPTL3MBTL1 | |
| SCHEMBL28037499 | 0.79 | NCEH1 (0.40) | HPGDTSHRHTR2AL3MBTL1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111123649-B | Negative photoresist composition containing high heat resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2024-01-30 | — | — | CN | claimed |
| CN-113999340-B | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-04-28 | — | — | CN | claimed |
| EP-1840650-B1 | Positive type radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-18 | — | — | EP | claimed |
| EP-1840650-A1 | Positive type radiation-sensitive resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | claimed |
| US-20060223010-A1 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | claimed |
| CN-111123649-B | Negative photoresist composition containing high heat resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2024-01-30 | — | — | CN | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| EP-1720063-B1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| CN-100486963-C | Sulfonium salt compound | WAKO PURE CHEM IND LTD (JP) | 2009-05-13 | — | — | CN | disclosed |
| EP-1840650-B1 | Positive type radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-18 | — | — | EP | disclosed |
| US-7488566-B2 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| EP-0789279-A1 | Polymer and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5576359-A | ANTHRACENE DERIVATIVE, SOLVENT, COMPOUND CONTAINING GLYCIDYL GROUPS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0636941-B1 | Deep ultraviolet absorbent and its use in pattern formation | WAKO PURE CHEM IND LTD (JP) | 1996-03-20 | — | — | EP | disclosed |
| EP-0636941-A1 | Deep ultraviolet absorbent and its use in pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-02-01 | — | — | EP | disclosed |