Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 2/20 | 0.42 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | HTR2A | P28223 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | HPGD | P15428 | 4/20 | 0.41 |
| ▸ | MEN1 | O00255 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | GLA | P06280 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | KDM4A | O75164 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12690103 | 0.82 | EPHX1 (0.40) | L3MBTL1HTR2AALDH1A1HPGDMEN1 | |
| SCHEMBL12325616 | 0.82 | KMT2A (0.42) | L3MBTL1HTR2AALDH1A1HPGDMEN1 | |
| SCHEMBL27887680 | 0.82 | ALDH1A1 (0.41) | MTNR1AMTNR1BL3MBTL1ALDH1A1HPGD | |
| SCHEMBL3199606 | 0.81 | EGFR (0.51) | L3MBTL1HTR2AALDH1A1HPGDMEN1 | |
| SCHEMBL25067042 | 0.80 | NCEH1 (0.37) | MTNR1AMTNR1BKDM4A | |
| SCHEMBL3197961 | 0.79 | MTNR1A (0.41) | MTNR1AMTNR1BL3MBTL1ALDH1A1HPGD | |
| SCHEMBL28195038 | 0.79 | HTR2A (0.50) | L3MBTL1HTR2AALDH1A1HPGDMEN1 | |
| SCHEMBL28087180 | 0.78 | HTR2A (0.50) | L3MBTL1HTR2AALDH1A1HPGDMEN1 | |
| SCHEMBL11987697 | 0.78 | EDNRA (0.38) | L3MBTL1HTR2AALDH1A1HPGDMEN1 | |
| SCHEMBL2914936 | 0.77 | SIRT5 (0.59) | L3MBTL1ALDH1A1HPGDMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1840650-B1 | Positive type radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-18 | — | — | EP | claimed |
| EP-1840650-A1 | Positive type radiation-sensitive resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | claimed |
| US-20060223010-A1 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | claimed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1840650-B1 | Positive type radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-18 | — | — | EP | disclosed |
| US-7488566-B2 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| EP-1640804-B1 | Positive-tone radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-19 | — | — | EP | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-7335457-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| EP-1840650-A1 | Positive type radiation-sensitive resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |
| US-20060223010-A1 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |