SCHEMBL3200869

SCHEMBL3200869

CC(O)Cc1ccc(CC(C)(c2ccc(CC(C)O)cc2)c2ccc(CC(C)O)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 6/20 0.41
ESR2 Q92731 5/20 0.41
TP53 P04637 1/20 0.41
TSHR P16473 1/20 0.41
TRPA1 O75762 2/20 0.38
ACACB O00763 2/20 0.35
TAAR1 Q96RJ0 3/20 0.34
SLC6A2 P23975 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18253225 0.82 TSHR (0.58) TP53TSHRACACB
SCHEMBL8679307 0.82 TSHR (0.58) TP53TSHRACACB
SCHEMBL41070 0.82 ESR1 (0.44) ESR1ESR2TP53TSHRACACB
SCHEMBL196800 0.78 TAAR1 (0.48) ESR1ESR2TSHRTRPA1TAAR1
SCHEMBL19646258 0.77 ADORA3 (0.48) ESR1ESR2TP53TSHRTRPA1
SCHEMBL16868329 0.76 ALDH1A1 (0.47) TAAR1
SCHEMBL2423098 0.76 ALDH1A1 (0.47) TAAR1
SCHEMBL2953697 0.75 ESR1 (0.69) ESR1ESR2TSHRSLC6A2
SCHEMBL6678242 0.74 ESR1 (0.39) ESR1ESR2TRPA1
SCHEMBL6604703 0.73 POLB (0.38) ESR1ESR2TSHRTRPA1ACACB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-20070004816-A1 Photocurable resin composition DSM IP ASSETS B.V. (NL) 2007-01-04 US disclosed
US-6180316-B1 SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS JSR CORPORATION (JP) 2001-01-30 US disclosed
US-6120972-A COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS JSR CORPORATION (JP) 2000-09-19 US disclosed
EP-0930541-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-07-21 EP disclosed
EP-0901043-A1 Radiation-sensitive resin composition JSR Corporation (JP) 1999-03-10 EP disclosed