SCHEMBL3201103

SCHEMBL3201103

CC(C)(C)OC(=O)COc1cc([S+](c2ccccc2)c2ccccc2)ccc1OC(C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.42
HPGD P15428 2/20 0.42
CYP2C19 P33261 2/20 0.42
POLB P06746 1/20 0.42
CYP2C9 P11712 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
ACLY P53396 3/20 0.42
LMNA P02545 1/20 0.38
MTNR1A P48039 2/20 0.37
MTNR1B P49286 2/20 0.37
KDM4E B2RXH2 2/20 0.36
MEN1 O00255 2/20 0.36
ALDH1A1 P00352 2/20 0.36
KMT2A Q03164 2/20 0.36
PTPN1 P18031 1/20 0.36
TSHR P16473 1/20 0.36
HSD17B10 Q99714 1/20 0.36
DDB1 Q16531 1/20 0.35
CRBN Q96SW2 1/20 0.35
PSEN1 P49768 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3191928 0.95 MAPT (0.42) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3195163 0.94 MAPT (0.44) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3193532 0.90 MTNR1A (0.45) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3203520 0.88 MTNR1A (0.47) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3206974 0.86 MAPT (0.43) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3203558 0.86 HPGD (0.43) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3206766 0.86 MAPT (0.43) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3203339 0.86 MAPT (0.43) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3190835 0.81 HPGD (0.40) MAPTHPGDCYP2C19POLBCYP2C9
SCHEMBL3190064 0.81 MAPT (0.43) MAPTHPGDCYP2C19POLBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed