Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.69 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.69 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.64 |
| ▸ | TSHR | P16473 | 2/20 | 0.58 |
| ▸ | GAA | P10253 | 1/20 | 0.56 |
| ▸ | TSPO | P30536 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.55 |
| ▸ | HPGD | P15428 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | POLB | P06746 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 1/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | GLA | P06280 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10152245 | 0.87 | KDM4E (0.60) | KDM4ESMN1; SMN2KMT2ATSHRGAA | |
| SCHEMBL29246468 | 0.87 | KMT2A (0.55) | KDM4ESMN1; SMN2KMT2ATSHRGAA | |
| SCHEMBL9141483 | 0.87 | KDM4E (0.54) | KDM4ESMN1; SMN2KMT2ATSHRGAA | |
| SCHEMBL11605995 | 0.85 | KDM4E (0.59) | KDM4ESMN1; SMN2KMT2ATSHRGAA | |
| SCHEMBL1757397 | 0.82 | KDM4E (0.56) | KDM4ESMN1; SMN2KMT2ATSHRGAA | |
| SCHEMBL29540705 | 0.82 | KDM4E (0.71) | KDM4EKMT2ATSHRTSPOALDH1A1 | |
| SCHEMBL31367787 | 0.82 | FABP4 (0.64) | KDM4ESMN1; SMN2TSHRALDH1A1HPGD | |
| SCHEMBL1004258 | 0.82 | FABP4 (0.64) | KDM4ESMN1; SMN2TSHRALDH1A1HPGD | |
| SCHEMBL151122 | 0.82 | KDM4E (0.71) | KDM4EKMT2ATSHRTSPOALDH1A1 | |
| SCHEMBL11811656 | 0.81 | KDM4E (0.80) | KDM4ESMN1; SMN2KMT2ATSHRGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1840650-B1 | Positive type radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-18 | — | — | EP | claimed |
| EP-1840650-A1 | Positive type radiation-sensitive resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | claimed |
| US-20060223010-A1 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | claimed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1840650-B1 | Positive type radiation-sensitive resin composition | JSR CORP (JP) | 2009-03-18 | — | — | EP | disclosed |
| US-7488566-B2 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| EP-1640804-B1 | Positive-tone radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-19 | — | — | EP | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-7335457-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| EP-1840650-A1 | Positive type radiation-sensitive resin composition | JSR Corporation (JP) | 2007-10-03 | — | — | EP | disclosed |
| US-20060223010-A1 | Positive type radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |