SCHEMBL3203458

SCHEMBL3203458

CC(C)(C)Oc1cccc(OC(C)(C)C)c1[S+](c1ccccc1)c1ccccc1.O=S(=O)([O-])c1c(F)cccc1F

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.32
NPC1 O15118 1/20 0.30
POLB P06746 1/20 0.30
SLC6A9 P48067 1/20 0.30
KCNH2 Q12809 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3192415 0.91 SLC6A9 (0.30) SLC6A9KCNH2
SCHEMBL3181629 0.90 SLC6A9 (0.30) SLC6A9KCNH2
SCHEMBL3197743 0.87 NPC1 (0.36) PKMNPC1POLB
SCHEMBL3191812 0.85
SCHEMBL3200895 0.84 GAA (0.33) KCNH2
SCHEMBL3190281 0.83 KMT2A (0.30)
SCHEMBL3183476 0.82 SLC22A12 (0.31)
SCHEMBL3193889 0.82 PKM (0.31) PKM
SCHEMBL3193372 0.81 PTGDR2 (0.35)
SCHEMBL3195450 0.81 PKM (0.32) PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed