SCHEMBL3204415

SCHEMBL3204415

Cc1cc(OCC(=O)OC(C)(C)C)ccc1[S+](c1ccccc1)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSEN1 P49768 2/20 0.43
PSEN2 P49810 2/20 0.43
APH1B Q8WW43 2/20 0.43
NCSTN Q92542 2/20 0.43
APH1A Q96BI3 2/20 0.43
PSENEN Q9NZ42 2/20 0.43
MAPT P10636 5/20 0.43
TDP1 Q9NUW8 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
PTPN1 P18031 1/20 0.43
ATM Q13315 1/20 0.42
LMNA P02545 2/20 0.42
HPGD P15428 2/20 0.42
POLB P06746 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
NPC1 O15118 2/20 0.40
RAB9A P51151 1/20 0.40
MCL1 Q07820 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3182687 0.90 PSEN1 (0.43) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3190437 0.89 MAPT (0.50) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3181640 0.88 MAPT (0.49) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL13399180 0.86 ALDH1A1 (0.46) MAPTTDP1L3MBTL1ATMLMNA
SCHEMBL3203010 0.86 MAPT (0.45) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3199978 0.86 MAPT (0.45) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL9947574 0.85 MAPT (0.47) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3183354 0.85 MAPT (0.47) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL13399665 0.85 HPGD (0.53) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL3203356 0.85 MAPT (0.46) PSEN1PSEN2APH1BNCSTNAPH1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed