⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1269508 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL20969298 | 0.69 | — | — | |
| SCHEMBL3713171 | 0.64 | — | — | |
| SCHEMBL19900855 | 0.64 | — | — | |
| SCHEMBL5232123 | 0.64 | — | — | |
| Hydrochloric Acid SCHEMBL29429357 | 0.61 | — | — | |
| Hydrochloric Acid SCHEMBL16213498 | 0.61 | — | — | |
| Hydrochloric Acid SCHEMBL7962851 | 0.61 | — | — | |
| SCHEMBL143180 | 0.61 | — | — | |
| SCHEMBL7108010 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114797506-B | Preparation method and application of ionized polyimide gas separation membrane | 中国科学院过程工程研究所 | 2023-08-01 | — | — | CN | claimed |
| CN-114797506-A | Preparation method and application of ionized polyimide gas separation membrane | 中国科学院过程工程研究所 | 2022-07-29 | — | — | CN | claimed |
| CN-115703850-B | Non-metallocene catalyst and preparation method and application thereof | 中国石油天然气股份有限公司 | 2024-04-30 | — | — | CN | disclosed |
| CN-115703850-A | Non-metallocene catalyst and preparation method and application thereof | 中国石油天然气股份有限公司 | 2023-02-17 | — | — | CN | disclosed |
| CN-114853797-A | Preparation method of alpha-amino boron cyclic compound | 中山大学 | 2022-08-05 | — | — | CN | disclosed |
| WO-2016183101-A1 | PALLADIUM-CATALYZED ARYLATION OF FLUOROALKYLAMINES | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2016-11-17 | — | — | WO | disclosed |
| US-7662540-B2 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7556911-B2 | Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method | FUJIFILM CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| US-20080213688-A1 | Photosensitive Transfer Material, Pattern Forming Process, and Patterns | FUJIFILM CORPORATION (JP) | 2008-09-04 | — | — | US | disclosed |
| US-20080088813-A1 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2008-04-17 | — | — | US | disclosed |
| CN-101142525-A | Pattern formation material, pattern formation device, and pattern formation method | FUJI FILM CORP (JP) | 2008-03-12 | — | — | CN | disclosed |
| US-20050037281-A1 | Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. | 2005-02-17 | — | — | US | disclosed |
| EP-1507171-A2 | Light-Sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-16 | — | — | EP | disclosed |
| US-20050025946-A1 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |
| EP-1489460-A2 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | Fuji Photo Film Co., Ltd. (JP) | 2004-12-22 | — | — | EP | disclosed |
| EP-0819000-A4 | NODULISPORIC ACID DERIVATIVES | MERCK & CO INC (US) | 2001-04-11 | — | — | EP | disclosed |
| CN-1184423-A | Nodulisporic acid derivatives | MERCK & CO INC (US) | 1998-06-10 | — | — | CN | disclosed |
| EP-0819000-A1 | NODULISPORIC ACID DERIVATIVES | Merck & Co., Inc. (US) | 1998-01-21 | — | — | EP | disclosed |
| WO-1983000458-A1 | MOLDING OF UNSATURATED POLYESTER | SAIDLA, GLEN, W. | 1983-02-17 | — | — | WO | disclosed |
| EP-0072024-A2 | Molding of unsaturated polyester | WHITNEY & COMPANY, INC. (US) | 1983-02-16 | — | — | EP | disclosed |