⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19293661 | 0.70 | — | — | |
| SCHEMBL5268499 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL7962854 | 0.67 | — | — | |
| SCHEMBL149335 | 0.65 | — | — | |
| SCHEMBL11881363 | 0.61 | — | — | |
| SCHEMBL125105 | 0.59 | — | — | |
| SCHEMBL20836269 | 0.59 | — | — | |
| SCHEMBL2134909 | 0.59 | — | — | |
| SCHEMBL25700 | 0.59 | — | — | |
| SCHEMBL553855 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115703850-B | Non-metallocene catalyst and preparation method and application thereof | 中国石油天然气股份有限公司 | 2024-04-30 | — | — | CN | disclosed |
| CN-115703850-A | Non-metallocene catalyst and preparation method and application thereof | 中国石油天然气股份有限公司 | 2023-02-17 | — | — | CN | disclosed |
| CN-114853797-A | Preparation method of alpha-amino boron cyclic compound | 中山大学 | 2022-08-05 | — | — | CN | disclosed |
| WO-2016183101-A1 | PALLADIUM-CATALYZED ARYLATION OF FLUOROALKYLAMINES | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2016-11-17 | — | — | WO | disclosed |
| CN-1950750-B | Pattern forming material, pattern forming apparatus, and pattern forming method | ASAHI KASEI E MATERIALS CORP | 2012-10-24 | — | — | CN | disclosed |
| CN-101052918-B | Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus, and pattern forming method | ASAHI KASEI E MATERIALS CORP | 2012-09-26 | — | — | CN | disclosed |
| CN-101103310-B | Material for pattern formation, apparatus for pattern formation, and method for pattern formation | FUJI FILM CORP | 2012-03-14 | — | — | CN | disclosed |
| CN-101124516-B | Pattern forming material, pattern forming apparatus, and pattern forming method | FUJI PHOTO FILM CO LTD | 2012-01-18 | — | — | CN | disclosed |
| CN-101410421-B | Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board | FUJI PHOTO FILM CO LTD | 2011-07-27 | — | — | CN | disclosed |
| US-7662540-B2 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2010-02-16 | — | — | US | disclosed |
| CN-1655059-A | Photosensitive transfer sheet, photosensitive laminated article, forming method of image pattern and cloth wire pattern | FUJI PHOTO FILM CO LTD (JP) | 2005-08-17 | — | — | CN | disclosed |
| CN-1641481-A | Light-sensitive transfer sheet, light-sensitive layers, method for forming image pattern and method for distribution pattern | FUJI PHOTO FILM CO LTD (JP) | 2005-07-20 | — | — | CN | disclosed |
| US-20050037281-A1 | Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. | 2005-02-17 | — | — | US | disclosed |
| EP-1507171-A2 | Light-Sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-16 | — | — | EP | disclosed |
| CN-1580953-A | Light-sensitive transfer sheet, light-sensitive layers, picture pattern forming method and layout pattern forming method | FUJI PHOTO FILM CO LTD (JP) | 2005-02-16 | — | — | CN | disclosed |
| US-20050025946-A1 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |
| CN-1573545-A | Light-sensitive sheet, light-sensitive layers, image pattern forming method, and wiring pattern forming method | FUJI PHOTO FILM CO LTD (JP) | 2005-02-02 | — | — | CN | disclosed |
| EP-1489460-A2 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | Fuji Photo Film Co., Ltd. (JP) | 2004-12-22 | — | — | EP | disclosed |
| EP-0819000-A4 | NODULISPORIC ACID DERIVATIVES | MERCK & CO INC (US) | 2001-04-11 | — | — | EP | disclosed |
| EP-0819000-A1 | NODULISPORIC ACID DERIVATIVES | Merck & Co., Inc. (US) | 1998-01-21 | — | — | EP | disclosed |