SCHEMBL3204705

SCHEMBL3204705

CC(O)(F)C(F)(Cl)S(=O)(=O)O

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
THRB P10828 1/20 0.32
PGK1 P00558 1/20 0.31
PGK2 P07205 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3204717 0.76 ALDH1A1 (0.36) ALDH1A1L3MBTL1THRB
SCHEMBL4376440 0.75 ALDH1A1 (0.39) ALDH1A1L3MBTL1
SCHEMBL9098380 0.75 ALDH1A1 (0.39) ALDH1A1L3MBTL1
SCHEMBL3179767 0.75 ALDH1A1 (0.39) ALDH1A1L3MBTL1
SCHEMBL3126504 0.70
SCHEMBL1304612 0.70
SCHEMBL575399 0.70
SCHEMBL3381812 0.70
SCHEMBL3184068 0.70
SCHEMBL1398392 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7669752-B2 Flux for soldering and circuit board HARIMA CHEMICALS, INC. (JP) 2010-03-02 US disclosed
US-20070241170-A1 FLUX FOR SOLDERING AND CIRCUIT BOARD HARIMA CHEMICALS, INC. 2007-10-18 US disclosed
US-7166152-B2 Pretreatment solution for providing catalyst for electroless plating, pretreatment method using the solution, and electroless plated film and/or plated object produced by use of the method DAIWA FINE CHEMICALS CO., LTD. (JP) 2007-01-23 US disclosed
US-20060147683-A1 Flux for soldering and circuit board HARIMA CHEMICALS, INC. 2006-07-06 US disclosed
EP-1342726-B1 Solder precipitating composition and solder precipitation method HARIMA CHEMICALS INC (JP) 2005-08-17 EP disclosed
US-6923875-B2 Solder precipitating composition HARIMA CHEMICALS, INC. (JP) 2005-08-02 US disclosed
US-20040043153-A1 Pretreatment solution for providing catalyst for electroless plating, pretreatment method using the solution, and electroless plated film and/or plated object produced by use of the method DAIWA FINE CHEMICALS CO., LTD. 2004-03-04 US disclosed
EP-1342726-A1 Solder precipitating composition and solder precipitation method Harima Chemicals, Inc. (JP) 2003-09-10 EP disclosed
US-20030159761-A1 Solder precipitating composition and solder precipitation method HARIMA CHEMICALS, INC. 2003-08-28 US disclosed
US-6235093-B1 SOLUTIONS OF WATER AND NOBLE METALS FOR REDUCTION DAIWA FINE CHEMICALS CO., LTD. (JP) 2001-05-22 US disclosed