SCHEMBL3206660

SCHEMBL3206660

CC(C)(C)OC(=O)COc1cc(OCC(=O)OC(C)(C)C)cc([S+](c2ccccc2)c2ccccc2)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.48
LMNA P02545 3/20 0.48
POLB P06746 1/20 0.48
CYP2C9 P11712 1/20 0.48
HPGD P15428 1/20 0.48
CYP2C19 P33261 1/20 0.48
NPSR1 Q6W5P4 1/20 0.48
PTPN1 P18031 2/20 0.44
PSEN1 P49768 2/20 0.42
PSEN2 P49810 2/20 0.42
APH1B Q8WW43 2/20 0.42
NCSTN Q92542 2/20 0.42
APH1A Q96BI3 2/20 0.42
PSENEN Q9NZ42 2/20 0.42
MTNR1A P48039 1/20 0.38
MTNR1B P49286 1/20 0.38
CTSK P43235 1/20 0.38
NPC1 O15118 2/20 0.37
MEN1 O00255 1/20 0.37
RAB9A P51151 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3192922 0.95 MAPT (0.45) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL3193987 0.95 MAPT (0.45) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL3183442 0.93 MAPT (0.51) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL3192511 0.92 POLB (0.45) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL8318359 0.90 MAPT (0.45) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL133377 0.89 PTPN1 (0.51) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL8323320 0.89 PTPN1 (0.51) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL3200027 0.87 PTPN1 (0.40) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL3200085 0.87 PSEN1 (0.41) MAPTLMNAPOLBCYP2C9HPGD
SCHEMBL8319923 0.86 PSEN1 (0.44) MAPTLMNAPOLBCYP2C9HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed