SCHEMBL3207962

SCHEMBL3207962

CCCCCCC[N+](CCC)(CCC)CCC

nearest known ligand 0.93

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SLC22A1 O15245 4/20 0.87
ALDH1A1 P00352 1/20 0.81
TP53 P04637 1/20 0.81
CYP3A4 P08684 1/20 0.81
ALOX15 P16050 1/20 0.81
TSHR P16473 1/20 0.81
ALOX12 P18054 1/20 0.81
SMN1; SMN2 Q16637 1/20 0.81
HIF1A Q16665 1/20 0.81
HSD17B10 Q99714 1/20 0.81
SLC22A2 O15244 1/20 0.80
DNM1 Q05193 7/20 0.72

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5819412 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5304214 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5304758 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL2303777 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL4374169 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL2871694 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5294484 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5269147 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5299409 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5814372 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12252632-B2 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method ENTEGRIS, INC. (US) 2025-03-18 US disclosed
CN-111849369-B Surface protective film and optical member 日东电工株式会社 2024-04-26 CN disclosed
CN-113382860-B Adhesive sheet and use thereof 日东电工株式会社 2024-03-22 CN disclosed
US-20220372329-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2022-11-24 US disclosed
CN-114258421-A Chemical mechanical polishing composition, cleaning composition, chemical mechanical polishing method and cleaning method CMC材料株式会社 2022-03-29 CN disclosed
CN-111849369-A Surface protection film and optical member 日东电工株式会社 2020-10-30 CN disclosed
WO-2020162231-A1 ADHESIVE SHEET AND USE THEREOF 日東電工株式会社 2020-08-13 WO disclosed
CN-109628004-A Film, surface protective film and optical component with finishing coat 日东电工株式会社 2019-04-16 CN disclosed
CN-103374309-B Surface protective film 日东电工株式会社 2017-05-31 CN disclosed
EP-2067770-B1 PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER WAKO PURE CHEM IND LTD (JP) 2017-04-12 EP disclosed
US-20120157680-A1 IONIC LIQUID CONTAINING ALLYLSULFONATE ANION WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-21 US disclosed
US-20100041916-A1 PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-02-18 US disclosed
EP-2067770-A1 PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER Wako Pure Chemical Industries, Ltd. (JP) 2009-06-10 EP disclosed
WO-2007006418-A1 IONIC-LIQUID-CONTAINING PRODUCTS FOR DYEING AND/OR BRIGHTENING KERATIN FIBRES HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2007-01-18 WO disclosed
WO-2006131234-A1 COSMETIC COMPOSITIONS COMPRISING IONIC LIQUIDS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2006-12-14 WO disclosed
US-4543356-A Quinazoline derivatives FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1985-09-24 US disclosed
EP-0030156-B1 QUINAZOLINE DERIVATIVES, PROCESSES FOR THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1984-03-21 EP disclosed
US-4429126-A ANTIASTHMA FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1984-01-31 US disclosed
US-4377580-A ANTIALLERGENIC AGENTS FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1983-03-22 US disclosed
EP-0030156-A1 Quinazoline derivatives, processes for their preparation and pharmaceutical compositions containing them FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1981-06-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100041916-A1 PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER SULT1A1, SULT2A1, STS SLC22A1 983/4885ALDH1A1 90/4885TP53 4469/4885
US-20120157680-A1 IONIC LIQUID CONTAINING ALLYLSULFONATE ANION ATXN2L, ARL1, INPPL1 SLC22A1 1635/4885ALDH1A1 3717/4885TP53 3461/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.