SCHEMBL3210593

SCHEMBL3210593

C=COCCO[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3273399 0.85 CDC25A (0.31)
SCHEMBL17358227 0.84
SCHEMBL17358197 0.78
SCHEMBL2784346 0.78
SCHEMBL3211236 0.77 DUT (0.34)
SCHEMBL1223591 0.76
SCHEMBL34509 0.76
SCHEMBL8094789 0.74
SCHEMBL17358230 0.73 ALDH1A1 (0.30)
Water SCHEMBL3259208 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5663260-A Hyperbranched copolymers from AB monomers and C monomers CORNELL RESEARCH FOUNDATION, INC. (US) 1997-09-02 US claimed
CN-115175952-B Aqueous resin composition, aqueous paint and coated article DIC株式会社 2023-08-29 CN disclosed
US-20230109243-A1 AQUEOUS RESIN COMPOSITION, AQUEOUS PAINT, AND COATED ARTICLE DIC CORPORATION (JP) 2023-04-06 US disclosed
EP-4122974-A1 AQUEOUS RESIN COMPOSITION, AQUEOUS COATING MATERIAL, AND COATED ARTICLE DIC Corporation (JP) 2023-01-25 EP disclosed
CN-115175952-A Aqueous resin composition, aqueous coating material, and coated article DIC株式会社 2022-10-11 CN disclosed
EP-1394153-B1 THIOL COMPOUND DERIVATIVES, HARDENING COMPOSITIONS CONTAINING THESE DERIVATIVES AND MOLDED ARTICLES THEREOF UNIMATEC CO LTD (JP) 2010-12-29 EP disclosed
US-7812157-B2 Thiol compound derivative, curable composition containing the derivative, and molded product thereof UNIMATEC CO., LTD. (JP) 2010-10-12 US disclosed
EP-1329468-B1 WATER-DISPERSIBLE POLYISOCYANATE COMPOSITION, PROCESS FOR ITS PRODUCTION, WATER-BASE CURABLE COMPOSITION AND ITS APPLICATION DAINIPPON INK & CHEMICALS (JP) 2010-06-16 EP disclosed
US-7682651-B2 Method for manufacturing display device CANON KABUSHIKI KAISHA (JP) 2010-03-23 US disclosed
CN-100564061-C Printing is with layered product and the printing process and the printed matter that use this layered product KIWA KAGAKU KOGYO K K (JP) 2009-12-02 CN disclosed
US-20030069353-A1 Water-dispersible polyisocyanate composition, process for its production, water-base curable composition and its application DAINIPPON INK AND CHEMICALS, INC. (JP) 2003-04-10 US disclosed
EP-0809225-B1 REFLECTIVE SHEET NIPPON CARBIDE KOGYO KK (JP) 2002-10-23 EP disclosed
US-20020086143-A1 Retroreflective sheeting having printed layer NIPPON CARBIDE KOGYO KABUSHIKI KAISHA 2002-07-04 US disclosed
US-6110574-A BASE RETROREFLECTIVE SHEETING HAVING A FLAT FRONT FACE LAYER AT THE LIGHT-INCIDENT SIDE, AND FLUORINE-CONTAINED RESIN FILM HAVING A TOTAL LIGHT TRANSMITTANCE OF AT LEAST 80%, LAMINATED ON THE FLAT FRONT FACE LAYER NIPPIN CARRIBE KOGYO KABUSHIKI KAISHA (JP) 2000-08-29 US disclosed
US-5840806-A COMPOSITION COMPRISING RESIN FORMED BY CONDENSATION OF POLYSILOXANE WITH POLYMER HAVING HYDROLYZABLE SILYL GROUP AND ADDITIONAL FUNCTIONAL GROUP, COMPOUND CAPABLE OF REACTING WITH SAID GROUP DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-11-24 US disclosed
CN-1175316-A Retroreflective sheet NIPPON CARBIDE KOGYO KK (JP) 1998-03-04 CN disclosed
EP-0809225-A1 REFLECTIVE SHEET NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1997-11-26 EP disclosed
US-5663260-A Hyperbranched copolymers from AB monomers and C monomers CORNELL RESEARCH FOUNDATION, INC. (US) 1997-09-02 US disclosed
EP-0791022-A1 HYPERBRANCHED COPOLYMERS FROM AB MONOMERS AND C MONOMERS CORNELL RESEARCH FOUNDATION, INC. (US) 1997-08-27 EP disclosed
WO-1996014345-A1 HYPERBRANCHED COPOLYMERS FROM AB MONOMERS AND C MONOMERS CORNELL RESEARCH FOUNDATION, INC. (US) 1996-05-17 WO disclosed