SCHEMBL321429

SCHEMBL321429

c1ccc(-c2c3ccccc3nc3ccccc23)nc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
METAP1 P53582 5/20 0.58
RAB9A P51151 6/20 0.54
LMNA P02545 5/20 0.54
ALDH1A1 P00352 5/20 0.54
NPC1 O15118 5/20 0.54
L3MBTL1 Q9Y468 3/20 0.54
HIF1A Q16665 2/20 0.54
HTT P42858 2/20 0.54
GAA P10253 1/20 0.54
KDM4E B2RXH2 6/20 0.54
CCR1 P32246 3/20 0.54
CCR5 P51681 3/20 0.54
CCR8 P51685 3/20 0.54
POLB P06746 2/20 0.54
CYP1A2 P05177 2/20 0.54
BLM P54132 1/20 0.54
DOHH Q9BU89 1/20 0.54
P4HTM Q9NXG6 1/20 0.54
SMN1; SMN2 Q16637 5/20 0.52
TDP1 Q9NUW8 4/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29488283 1.00 METAP1 (0.58) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL9601589 0.85 ALDH1A1 (0.52) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL29660711 0.85 ALDH1A1 (0.52) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL17008146 0.84 KDM4E (0.68) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL29769628 0.84 KDM4E (0.68) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL9876002 0.82 LMNA (0.44) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL4496172 0.82 KDM4E (0.50) METAP1RAB9ALMNAALDH1A1NPC1
Phenazine SCHEMBL25380403 0.81 KDM4E (0.74) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL10061794 0.81 ALDH1A1 (0.53) METAP1RAB9ALMNAALDH1A1NPC1
SCHEMBL9602877 0.81 KMT2A (0.44) METAP1RAB9ALMNAALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 128 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106233205-B Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package 日立化成株式会社 2020-06-23 CN claimed
EP-0305545-B1 SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE Hitachi Chemical Co., Ltd. (JP) 1993-02-10 EP claimed
US-5045433-A Photopolymerization initiators HITACHI CHEMICAL CO., LTD. (JP) 1991-09-03 US claimed
EP-0305545-A1 SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE Hitachi Chemical Co., Ltd. (JP) 1989-03-08 EP claimed
JP-63256602-A None JP disclosed
US-12353130-B2 Photosensitive resin composition and photosensitive resin multilayer body ASAHI KASEI KABUSHIKI KAISHA (JP) 2025-07-08 US disclosed
US-20240408595-A1 STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-12-12 US disclosed
US-12032286-B2 Method for producing multi-layered type microchannel device using photosensitive resin laminate ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-07-09 US disclosed
CN-118119565-A Structure having micro-channel, method for manufacturing same, and micro-channel device 旭化成株式会社 2024-05-31 CN disclosed
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 US disclosed
US-20230375930-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-11-23 US disclosed
CN-116981999-A Photosensitive resin laminate and method for producing same 旭化成株式会社 2023-10-31 CN disclosed
WO-2007089040-A1 LIQUID CRYSTAL DISPLAY DEVICE AND COLOR FILM PLATE, AND PROCESSES FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2007-08-09 WO disclosed
US-20030186166-A1 Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board HITACHI CHEMICAL CO., LTD. (JP) 2003-10-02 US disclosed
EP-0398713-B1 Photosensitive resin composition and laminate using the same HITACHI CHEMICAL CO LTD (JP) 1994-07-20 EP disclosed
EP-0305545-B1 SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE Hitachi Chemical Co., Ltd. (JP) 1993-02-10 EP disclosed
US-5045433-A Photopolymerization initiators HITACHI CHEMICAL CO., LTD. (JP) 1991-09-03 US disclosed
US-4980266-A Excellent stability and resistance to plating HITACHI CHEMICAL COMPANY, LTD. (JP) 1990-12-25 US disclosed
EP-0305545-A1 SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE Hitachi Chemical Co., Ltd. (JP) 1989-03-08 EP disclosed
JP-S63256602-A PHOTOPOLYMERIZABLE COMPOSITION HITACHI CHEM CO LTD 1988-10-24 JP disclosed