SCHEMBL3220637

SCHEMBL3220637

CC1=C(C)C(C)C([Ti](Oc2cc(C)cc(C(C)(C)C)c2[SiH](C)C)=C(c2ccccc2)c2ccccc2)=C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL713880 0.84
Hydrochloric Acid SCHEMBL2384104 0.78
Hydrochloric Acid SCHEMBL5898707 0.78
Hydrochloric Acid SCHEMBL820142 0.76 ATM (0.32)
Hydrochloric Acid SCHEMBL715438 0.76 RXRA (0.32)
Hydrochloric Acid SCHEMBL714698 0.76 MDM2 (0.30)
SCHEMBL27517839 0.75
Hydrochloric Acid SCHEMBL720099 0.75
Hydrochloric Acid SCHEMBL715142 0.74
SCHEMBL5620183 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100063228-A1 TRANSITION METAL COMPLEX, PROCESS FOR PRODUCING THE SAME, AND USE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-11 US disclosed