SCHEMBL3221558

SCHEMBL3221558

C1CCOCCOCCOC1

nearest known ligand 0.89

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.89
TTR P02766 1/20 0.67
TSHR P16473 1/20 0.50
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
KDM4E B2RXH2 1/20 0.31
GAA P10253 1/20 0.31
CYP2C9 P11712 1/20 0.31
LMNA P02545 2/20 0.30
CRHBP P24387 2/20 0.30
HTT P42858 2/20 0.30
CRHR2 Q13324 2/20 0.30
SMN1; SMN2 Q16637 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrahydrofuran SCHEMBL9498119 1.00 ALDH1A1 (0.89) ALDH1A1TTRTSHRMEN1KMT2A
Dioxane SCHEMBL28105552 1.00 ALDH1A1 (0.89) ALDH1A1TTRTSHRMEN1KMT2A
Tetrahydrofuran SCHEMBL10829410 1.00 ALDH1A1 (0.89) ALDH1A1TTRTSHRMEN1KMT2A
Dioxane SCHEMBL460231 1.00 ALDH1A1 (0.89) ALDH1A1TTRTSHRMEN1KMT2A
SCHEMBL3391604 1.00 ALDH1A1 (0.89) ALDH1A1TTRTSHRMEN1KMT2A
SCHEMBL541039 1.00
Tetrahydrofuran SCHEMBL112157 1.00
Tetrahydrofuran SCHEMBL317459 1.00 ALDH1A1 (0.89) ALDH1A1TTRTSHRMEN1KMT2A
Tetrahydrofuran SCHEMBL7999698 1.00 ALDH1A1 (0.89) ALDH1A1TTRTSHRMEN1KMT2A
Oxirane SCHEMBL9421789 0.95 ALDH1A1 (0.80) ALDH1A1TTRTSHRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4711835-A Process for photolithographing a thick layer of paste deposited on a substrate THOMSON-CSF (FR) 1987-12-08 US claimed
US-12429777-B2 Photoresist stripper composition for manufacturing display LTC CO., LTD. (KR) 2025-09-30 US disclosed
US-20220404710-A1 PHOTORESIST STRIPPER COMPOSITION FOR MANUFACTURING DISPLAY LTC CO., LTD. (KR) 2022-12-22 US disclosed
EP-4063957-A1 PHOTORESIST STRIPPER COMPOSITION FOR MANUFACTURING DISPLAY LTC Co. Ltd. (KR) 2022-09-28 EP disclosed
US-20100065895-A1 Method for producing at least one porous layer ROBERT BOSCH GMBH (DE) 2010-03-18 US disclosed
US-7399045-B2 Image recording apparatus FUJI XEROX CO., LTD. (JP) 2008-07-15 US disclosed
US-20060203029-A1 Image recording apparatus FUJI XEROX CO., LTD. 2006-09-14 US disclosed