Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.59 |
| ▸ | CA2 | P00918 | 1/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 3/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | TP53 | P04637 | 2/20 | 0.52 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.49 |
| ▸ | RXRA | P19793 | 1/20 | 0.49 |
| ▸ | RXRB | P28702 | 1/20 | 0.49 |
| ▸ | SRD5A2 | P31213 | 3/20 | 0.48 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.48 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | FABP2 | P12104 | 1/20 | 0.47 |
| ▸ | PPARG | P37231 | 1/20 | 0.47 |
| ▸ | PPARA | Q07869 | 1/20 | 0.47 |
| ▸ | SLC22A12 | Q96S37 | 1/20 | 0.47 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | FAAH | O00519 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6891189 | 0.94 | HSD17B10 (0.59) | CA1CA2KMT2ATSHRHSD17B10 | |
| SCHEMBL29385898 | 0.87 | CA1 (0.59) | CA1CA2KMT2ATSHRHSD17B10 | |
| SCHEMBL3018669 | 0.86 | RARB (0.54) | CA1CA2KMT2ATSHRHSD17B10 | |
| Benzoic Acid SCHEMBL27552887 | 0.85 | CA1 (0.50) | CA1CA2KMT2ATSHRHSD17B10 | |
| SCHEMBL27867240 | 0.85 | CA1 (0.57) | CA1CA2KMT2ATSHRHSD17B10 | |
| SCHEMBL20076975 | 0.84 | ELANE (0.60) | KMT2ATSHRALDH1A1SRD5A2SMN1; SMN2 | |
| SCHEMBL5718737 | 0.83 | CA1 (0.55) | CA1CA2KMT2ATSHRHSD17B10 | |
| SCHEMBL8733203 | 0.83 | CA1 (0.55) | CA1CA2KMT2ATSHRHSD17B10 | |
| SCHEMBL28050269 | 0.83 | TSHR (0.59) | CA1CA2KMT2ATSHRHSD17B10 | |
| SCHEMBL27717363 | 0.83 | CA1 (0.55) | CA1CA2KMT2ATSHRHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0279630-B1 | DEVELOPER FOR LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE CAPABLE OF PROCESSING COMMONLY THE NEGATIVE-TYPE AND THE POSITIVE TYPE AND DEVELOPER COMPOSITION FOR LIGHT-SENSITIVE MATERIAL | KONICA CORPORATION (JP) | 1993-10-13 | — | — | EP | claimed |
| EP-0279630-A1 | Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive type and developer composition for light-sensitive material | KONICA CORPORATION (JP) | 1988-08-24 | — | — | EP | claimed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| US-20250367166-A1 | NEXT GENERATION DIPROVOCIMS THAT ACTIVATE THE INNATE AND ADAPTIVE IMMUNE RESPONSE | SCRIPPS RESEARCH INST (US) | 2025-12-04 | — | — | US | disclosed |
| US-12275693-B2 | Onium salt, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-04-15 | — | — | US | disclosed |
| WO-2025041813-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ASSEMBLY | 日産化学株式会社 | 2025-02-27 | — | — | WO | disclosed |
| CN-111936471-B | Non-fused thiophene derivatives and uses thereof | 埃尼奥制药公司 | 2024-10-29 | — | — | CN | disclosed |
| US-20240302744-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-12 | — | — | US | disclosed |
| CN-117063129-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2023-11-14 | — | — | CN | disclosed |
| WO-2023212650-A1 | NEXT GENERATION DIPROVOCIMS THAT ACTIVATE THE INNATE AND ADAPTIVE IMMUNE RESPONSE | THE SCRIPPS RESEARCH INSTITUTE (US) | 2023-11-02 | — | — | WO | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| EP-0279630-B1 | DEVELOPER FOR LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE CAPABLE OF PROCESSING COMMONLY THE NEGATIVE-TYPE AND THE POSITIVE TYPE AND DEVELOPER COMPOSITION FOR LIGHT-SENSITIVE MATERIAL | KONICA CORPORATION (JP) | 1993-10-13 | — | — | EP | disclosed |
| EP-0507576-A1 | Polypropylene-based resin compositions | TOSOH CORPORATION (JP) | 1992-10-07 | — | — | EP | disclosed |
| US-5106724-A | High speed, odorless | KONICA CORPORATION (JP) | 1992-04-21 | — | — | US | disclosed |
| US-4699698-A | Preparation of benzoic acid ortho-esters and novel compounds of this type | BASF AKTIENGESELLSCHAFT (DE) | 1987-10-13 | — | — | US | disclosed |
| US-4699698-A | Preparation of benzoic acid ortho-esters and novel compounds of this type | BASF AKTIENGESELLSCHAFT (DE) | 1987-10-13 | — | — | US | disclosed |
| US-4304715-A | Enkephalin analogues | HUDSON DEREK | 1981-12-08 | — | — | US | disclosed |
| US-RE30731-E | Enkephalin analogues | Hudson, Derek (GB) | 1981-09-01 | — | — | US | disclosed |
| US-4198398-A | Enkephalin analogues | HUDSON DEREK (GB) | 1980-04-15 | — | — | US | disclosed |
| US-4009208-A | N,N'-HEPTAMETHYLENEBIS(4-METHOXYBENZAMIDE) | STERLING DRUG INC. (US) | 1977-02-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12275693-B2 | Onium salt, chemically amplified resist composition and patterning process | PAG1, SLC6A5, LBR | CA1 1236/4885CA2 162/4885KMT2A 1890/4885 |
| US-20250367166-A1 | NEXT GENERATION DIPROVOCIMS THAT ACTIVATE THE INNATE AND ADAPTIVE IMMUNE RESPONSE | TLR1, TLR4, TLR3 | CA1 2685/4885CA2 2636/4885KMT2A 1352/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.