⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3229828 | 0.85 | — | — | |
| SCHEMBL3227325 | 0.78 | — | — | |
| SCHEMBL28232060 | 0.76 | — | — | |
| SCHEMBL6155343 | 0.74 | — | — | |
| SCHEMBL28959211 | 0.74 | — | — | |
| SCHEMBL1756689 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL11080400 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL27509464 | 0.72 | NOS3 (0.32) | — | |
| SCHEMBL9344941 | 0.70 | TP53 (0.38) | — | |
| Propanol SCHEMBL27533077 | 0.69 | CNR2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111659451-B | Preparation method and application of nitrogen vacancy-containing few-layer porous carbon nitride photocatalyst | 中国科学院山西煤炭化学研究所 | 2023-03-24 | — | — | CN | disclosed |
| CN-111659451-A | Preparation method and application of nitrogen vacancy-containing few-layer porous carbon nitride photocatalyst | 中国科学院山西煤炭化学研究所 | 2020-09-15 | — | — | CN | disclosed |
| US-20100068480-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | CITICORP NORTH AMERICA, INC., AS AGENT | 2010-03-18 | — | — | US | disclosed |
| US-20090068413-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2009-03-12 | — | — | US | disclosed |
| US-20060275702-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-12-07 | — | — | US | disclosed |
| US-20060057495-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI | 2006-03-16 | — | — | US | disclosed |
| US-20010019811-A1 | Negative-working photosensitive resin composition and photosensitive resin plate using the same | TAKANASHI HIROSHI (JP) | 2001-09-06 | — | — | US | disclosed |