SCHEMBL3248478

SCHEMBL3248478

CCc1ccc(S(=O)(=O)CS(=O)(=O)c2ccc(CC)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.61
PLCG1 P19174 1/20 0.54
PSIP1 O75475 2/20 0.54
UCHL1 P09936 1/20 0.48
KMT2A Q03164 3/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
GAA P10253 1/20 0.45
ALDH1A1 P00352 3/20 0.44
HPGD P15428 2/20 0.44
TP53 P04637 1/20 0.44
MEN1 O00255 2/20 0.44
KDM4E B2RXH2 1/20 0.42
F2 P00734 1/20 0.42
MAPT P10636 1/20 0.42
VDR P11473 1/20 0.42
LMNA P02545 1/20 0.41
HTT P42858 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9908320 0.88 PSIP1 (0.68) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL27277400 0.82 CA2 (0.57) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL30474466 0.82 CA2 (0.63) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL18231178 0.82 CA2 (0.57) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL678812 0.80 CA2 (0.67) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL23554972 0.79 CA2 (0.53) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL12075458 0.79 CA2 (0.59) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL20709252 0.79 CA2 (0.53) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL3645676 0.79 CA2 (0.53) CA2PSIP1UCHL1KMT2AL3MBTL1
SCHEMBL3650831 0.79 CA2 (0.60) CA2PSIP1UCHL1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0989460-B1 PATTERN FORMING METHOD AZ ELECTRONIC MATERIALS USA (US) 2010-05-26 EP disclosed
US-7638654-B2 1-fluoro-1, 1-bis-(phenylsulfonyl)methane and production method thereof NAGOYA INSTITUTE OF TECHNOLOGY (JP) 2009-12-29 US disclosed
US-20090131723-A1 1-Fluoro-1,1-Bis-(Phenylsulfonyl)Methane and Production Method Thereof TOSOH F-TECH, INC. (JP) 2009-05-21 US disclosed
EP-1992612-A1 1-FLUORO-1,1-BIS(PHENYLSULFONYL)METHANE AND METHOD FOR PRODUCING SAME NAGOYA INSTITUTE OF TECHNOLOGY (JP) 2008-11-19 EP disclosed
US-6527966-B1 Forming a pattern composed of an etchable layer by conducting dry etching of an etchable layer formed on a substrate for semiconductor through a mask of patterned radiation sensitive material coating formed on the etchable layer CLARIANT FINANCE (BVI) LIMITED (VG) 2003-03-04 US disclosed
US-6479210-B2 COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY CLARIANT FINANCE (BVI) LIMITED (VG) 2002-11-12 US disclosed
US-20010036589-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION MERCK PATENT GMBH (DE) 2001-11-01 US disclosed
EP-0827970-B1 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT FINANCE BVI LTD (VG) 2001-09-26 EP disclosed
EP-0989460-A1 PATTERN FORMING METHOD Clariant Finance (BVI) Limited (VG) 2000-03-29 EP disclosed
EP-0989459-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION Clariant Finance (BVI) Limited (VG) 2000-03-29 EP disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
EP-0827970-A2 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-03-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090131723-A1 1-Fluoro-1,1-Bis-(Phenylsulfonyl)Methane and Production Method Thereof CYP2S1, ARSA, MSMO1 CA2 1360/4885PLCG1 1435/4885PSIP1 354/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.