SCHEMBL325041

SCHEMBL325041

C=CC(=O)OCCNS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 12/20 0.47
CA2 P00918 12/20 0.47
MMP1 P03956 6/20 0.47
MMP2 P08253 6/20 0.47
MMP9 P14780 6/20 0.47
MMP8 P22894 6/20 0.47
MMP13 P45452 6/20 0.47
TSHR P16473 5/20 0.39
ALDH1A1 P00352 4/20 0.39
TP53 P04637 3/20 0.39
HIF1A Q16665 3/20 0.39
CYP3A4 P08684 2/20 0.39
HSD17B10 Q99714 1/20 0.39
HPGD P15428 1/20 0.36
THRB P10828 1/20 0.34
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
F2 P00734 1/20 0.31
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28384325 0.99 CA1 (0.46) CA1CA2MMP1MMP2MMP9
SCHEMBL10151017 0.96 CA1 (0.41) CA1CA2MMP1MMP2MMP9
SCHEMBL10212539 0.90 TSHR (0.42) CA1CA2MMP1MMP2MMP9
SCHEMBL775846 0.83 TSHR (0.44) CA1CA2TSHRALDH1A1TP53
Acrylic Acid Ethyl Ester SCHEMBL190577 0.83 CA1 (0.42) CA1CA2MMP1MMP2MMP9
SCHEMBL10151013 0.81 TSHR (0.47) CA1CA2MMP1MMP2MMP9
Acrylic Acid Ethyl Ester SCHEMBL29418175 0.81 CA1 (0.40) CA1CA2MMP1MMP2MMP9
SCHEMBL19042275 0.81 CA2 (0.50) CA1CA2MMP1MMP2MMP9
Acrylic Acid Ethyl Ester SCHEMBL30726766 0.81 CA1 (0.44) CA1CA2MMP1MMP2MMP9
SCHEMBL31127901 0.80 TSHR (0.36) CA1CA2MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
US-20170184964-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184962-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184963-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
EP-2590801-A1 DURABLE HYDROPHOBIC STRUCTURED SURFACE 3M Innovative Properties Company (US) 2013-05-15 EP disclosed
WO-2012006207-A1 DURABLE HYROPHOBIC STRUCTURED SURFACE 3M INNOVATIVE PROPERTIES COMPANY (US) 2012-01-12 WO disclosed