⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2190554 | 0.74 | CA12 (0.30) | — | |
| SCHEMBL1516209 | 0.71 | — | — | |
| SCHEMBL777574 | 0.71 | CA1 (0.33) | — | |
| SCHEMBL4814244 | 0.70 | CA12 (0.30) | — | |
| SCHEMBL9341953 | 0.70 | CA12 (0.30) | — | |
| SCHEMBL4805833 | 0.69 | — | — | |
| SCHEMBL2951024 | 0.69 | CA1 (0.32) | — | |
| SCHEMBL9341958 | 0.68 | — | — | |
| SCHEMBL778711 | 0.68 | ALOX5AP (0.31) | — | |
| SCHEMBL28745355 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-RE40211-E1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-04-01 | — | — | US | claimed |
| EP-0440375-B1 | Diazodisulfones | WAKO PURE CHEM IND LTD (JP) | 1994-07-13 | — | — | EP | claimed |
| EP-0440375-A1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | claimed |
| EP-0989460-B1 | PATTERN FORMING METHOD | AZ ELECTRONIC MATERIALS USA (US) | 2010-05-26 | — | — | EP | disclosed |
| US-RE40211-E1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-04-01 | — | — | US | disclosed |
| US-6544712-B1 | Sensitivity, resist pattern profile, and aging stability; suitable to fine processing with radiations such as ultraviolet rays, excimer laser, x-rays, electron beams | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-04-08 | — | — | US | disclosed |
| US-6527966-B1 | Forming a pattern composed of an etchable layer by conducting dry etching of an etchable layer formed on a substrate for semiconductor through a mask of patterned radiation sensitive material coating formed on the etchable layer | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-04 | — | — | US | disclosed |
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | disclosed |
| US-6476240-B2 | POLYMERS DERIVED FROM AN UNSATURATED FUSED CYCLIC HYDROCARBON (SUCH AS PERHYDRO-2,3-DIDEHYDRO-1,4:5,8-DIMETHANONAPHTHALENE) JOINED BY A LINKER TO AN ESTER GROUP HAVING ONE OR TWO PROTECTED HYDROXYLS; USE AS PHOTORESIST | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| US-20020042531-A1 | Polymers derived from an unsaturated fused cyclic hydrocarbon (such as perhydro-2,3-didehydro-1,4:5,8-dimethanonaphthalene) joined by a linker to an ester group having one or two protected hydroxyls; use as photoresist | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-04-11 | — | — | US | disclosed |
| US-6331602-B1 | Monomer and a polymer obtained therefrom | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2001-12-18 | — | — | US | disclosed |
| EP-0989460-A1 | PATTERN FORMING METHOD | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| EP-0989459-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| EP-0918048-A1 | A novel monomer and a polymer obtained therefrom | Wako Pure Chemical Industries, Ltd. (JP) | 1999-05-26 | — | — | EP | disclosed |
| US-5856521-A | Acrylic or methacrylic acid derivatives and polymers obtained therefrom | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| EP-0875789-A1 | Resist composition and its use for forming pattern | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0875496-A1 | Acrylic or methacrylic acid derivatives and polymers obtained therefrom | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0440375-B1 | Diazodisulfones | WAKO PURE CHEM IND LTD (JP) | 1994-07-13 | — | — | EP | disclosed |
| US-5216135-A | Photosensitive material which generates an acid by irradiation ; high transmittance, solution stability in photoresists and dissolution inhibiting of photoresists in alkali developers | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| EP-0440375-A1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |