SCHEMBL3256458

SCHEMBL3256458

Cc1cc(C(COc2ccc(C(=O)OC(C)(C)C)cc2)c2cc(C)c(OCC(=O)OC(C)(C)C)cc2C)c(C)cc1OCC(=O)OC(C)(C)C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.41
GAA P10253 3/20 0.41
MEN1 O00255 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
MAPT P10636 3/20 0.37
PPARD Q03181 7/20 0.37
PTPN1 P18031 1/20 0.37
HPGD P15428 3/20 0.36
POLB P06746 2/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
PSEN1 P49768 1/20 0.35
PSEN2 P49810 1/20 0.35
APH1B Q8WW43 1/20 0.35
NCSTN Q92542 1/20 0.35
APH1A Q96BI3 1/20 0.35
PSENEN Q9NZ42 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3256457 0.79 CNR1 (0.43) KMT2AGAAMEN1L3MBTL1MAPT
SCHEMBL5350412 0.70 MAPT (0.60) KMT2AGAAMEN1L3MBTL1MAPT
SCHEMBL1495913 0.69 MAPT (0.47) KMT2AGAAMEN1L3MBTL1MAPT
SCHEMBL1964630 0.69 PLA2G4B (0.61) PTPN1MAPK1TSHR
SCHEMBL3015438 0.69 MAPT (0.49) KMT2AMEN1MAPTHPGDPOLB
SCHEMBL11887264 0.69 PARP10 (0.58) KMT2AGAAL3MBTL1MAPTHPGD
SCHEMBL23383136 0.68 MAPT (0.41) GAAMAPTPOLBNPSR1LMNA
SCHEMBL28496683 0.68 KMT2A (0.51) KMT2AGAAMEN1L3MBTL1MAPT
SCHEMBL3590323 0.68 KDM4E (0.48) KMT2AMEN1L3MBTL1MAPTHPGD
SCHEMBL3011856 0.67 KMT2A (0.46) KMT2AGAAMEN1L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0989460-B1 PATTERN FORMING METHOD AZ ELECTRONIC MATERIALS USA (US) 2010-05-26 EP disclosed
US-6479210-B2 COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY CLARIANT FINANCE (BVI) LIMITED (VG) 2002-11-12 US disclosed
US-20010036589-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION MERCK PATENT GMBH (DE) 2001-11-01 US disclosed
EP-0989460-A1 PATTERN FORMING METHOD Clariant Finance (BVI) Limited (VG) 2000-03-29 EP disclosed
EP-0989459-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION Clariant Finance (BVI) Limited (VG) 2000-03-29 EP disclosed