SCHEMBL3256457

SCHEMBL3256457

Cc1cc(C(c2ccc(OCC(=O)OC(C)(C)C)cc2)c2cc(C)c(OCC(=O)OC(C)(C)C)cc2C)c(C)cc1OCC(=O)OC(C)(C)C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 1/20 0.43
PSEN1 P49768 2/20 0.40
PSEN2 P49810 2/20 0.40
APH1B Q8WW43 2/20 0.40
NCSTN Q92542 2/20 0.40
APH1A Q96BI3 2/20 0.40
PSENEN Q9NZ42 2/20 0.40
GAA P10253 3/20 0.40
PTPN1 P18031 1/20 0.40
HPGD P15428 3/20 0.39
POLB P06746 2/20 0.39
MAPT P10636 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
TDP1 Q9NUW8 2/20 0.38
NPC1 O15118 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8958894 0.82 CNR1 (0.53) CNR1PSEN1PSEN2APH1BNCSTN
SCHEMBL3256458 0.79 KMT2A (0.41) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL12227870 0.78 GAA (0.45) GAAPOLBMAPTNPSR1TDP1
SCHEMBL11917864 0.77 PTPN1 (0.54) CNR1PSEN1PSEN2APH1BNCSTN
SCHEMBL14477995 0.76 THRA (0.38) CNR1GAAHPGDPOLBMAPT
SCHEMBL13801007 0.76 GAA (0.41) GAAHPGDTDP1NPC1MEN1
SCHEMBL9772363 0.75 RAB9A (0.52) CNR1PSEN1PSEN2APH1BNCSTN
SCHEMBL8372961 0.73 PSEN1 (0.46) CNR1PSEN1PSEN2APH1BNCSTN
SCHEMBL5515918 0.73 PSEN1 (0.49) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL6654340 0.73 LMNA (0.58) PSEN1PSEN2APH1BNCSTNAPH1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0989460-B1 PATTERN FORMING METHOD AZ ELECTRONIC MATERIALS USA (US) 2010-05-26 EP disclosed
US-6479210-B2 COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY CLARIANT FINANCE (BVI) LIMITED (VG) 2002-11-12 US disclosed
US-20010036589-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION MERCK PATENT GMBH (DE) 2001-11-01 US disclosed
EP-0989460-A1 PATTERN FORMING METHOD Clariant Finance (BVI) Limited (VG) 2000-03-29 EP disclosed
EP-0989459-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION Clariant Finance (BVI) Limited (VG) 2000-03-29 EP disclosed